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Volumn 91, Issue , 2012, Pages 93-97
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A modified offset roll printing for thin film transistor applications
a
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Author keywords
Offset roll printing; Printing plate (clich ); Surface energy; TFT
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Indexed keywords
CHANNEL WIDTHS;
DEEP REACTIVE ION ETCHING;
ETCHING METHOD;
FAVORABLE CONDITIONS;
FINE PATTERN;
HIGH RESOLUTION;
HIGH SURFACE ENERGY;
HIGH THROUGHPUT;
INK TRANSFER;
LOW SURFACE ENERGY;
M-LINES;
OPTIMAL ANGLE;
PRINTING METHOD;
PRINTING PROCESS;
RIGID SUBSTRATES;
ROLL SPEED;
SIDEWALL ANGLES;
SILVER PASTES;
SURFACE ENERGY ANALYSIS;
TFT;
TOP GATE;
TRANSFER INK;
ENERGY MANAGEMENT;
FIELD EFFECT TRANSISTORS;
FINITE ELEMENT METHOD;
INTERFACIAL ENERGY;
PRINTING PLATES;
REACTIVE ION ETCHING;
ROLLS (MACHINE COMPONENTS);
SEMICONDUCTING SILICON COMPOUNDS;
SURFACE CHEMISTRY;
THIN FILM TRANSISTORS;
THIN FILMS;
PRINTING;
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EID: 83455219497
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2011.11.010 Document Type: Article |
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Times cited : (25)
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References (14)
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