Effect of Annealing Temperature on TiO 2 Nanorod Films Prepared by dc Reactive Magnetron Sputtering for Dye-Sensitized Solar Cells

Journal of Inorganic and Organometallic Polymers and Materials

Volumn 21, Issue 4, 2011, Pages 770-776

  Meng, Lijian ^a,b   Li, Can ^c   dos Santos, M P ^d,e  

^a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

^b UNIVERSITY OF MINHO   (Portugal)

^c DALIAN INSTITUTE OF CHEMICAL PHYSICS   (China)

^d UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^e UNIVERSITY OF ÉVORA   (Portugal)

Author keywords

Annealing; DSSC; Nanorod; Sputtering; TiO 2

Indexed keywords

[110] DIRECTION; ANATASE TIO; ANNEALING TEMPERATURES; COATED GLASS SUBSTRATES; DC REACTIVE MAGNETRON SPUTTERING; DSSC; DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; LIGHT INTENSITY; NANOROD FILMS; PREFERRED ORIENTATIONS; ROOM TEMPERATURE; TIO; WORKING ELECTRODE; XRD MEASUREMENTS;

ANNEALING; CONVERSION EFFICIENCY; FILM PREPARATION; ITO GLASS; NANORODS; PHOTOELECTROCHEMICAL CELLS; SPUTTERING; SUBSTRATES; TITANIUM DIOXIDE;

SOLAR CELLS;

EID: 82555189784     PISSN: 15741443     EISSN: 15741451     Source Type: Journal    
DOI: 10.1007/s10904-011-9538-y     Document Type: Article

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