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Volumn 28, Issue 11, 2011, Pages
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Simulation and suppression of the gas phase pre-reaction in metal-organic chemical vapor deposition of ZnO
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Author keywords
[No Author keywords available]
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Indexed keywords
COOLING WATER;
FILM GROWTH;
II-VI SEMICONDUCTORS;
INDUSTRIAL CHEMICALS;
ORGANIC CHEMICALS;
ORGANOMETALLICS;
ZINC OXIDE;
CHEMICAL VAPOR DEPOSITION REACTORS;
CONDITION;
GAS-PHASES;
METAL-ORGANIC CHEMICAL VAPOUR DEPOSITIONS;
PRE-REACTIONS;
RATE OF COOLING;
REACTION MECHANISM;
REACTION SPECIES;
SUBSTRATES TEMPERATURE;
ZNO FILMS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
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EID: 82055193328
PISSN: 0256307X
EISSN: 17413540
Source Type: Journal
DOI: 10.1088/0256-307X/28/11/116803 Document Type: Article |
Times cited : (2)
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References (22)
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