Thin films of semifluorinated block copolymers prepared by ATRP

Macromolecular Chemistry and Physics

Volumn 212, Issue 22, 2011, Pages 2399-2405

  Irita, Tomomi ^a   Chen, Dian ^b   Li, Xuefa ^c   Wang, Jin ^c   Russell, Thomas P ^b  

^a DAIKIN INDUSTRIES LTD   (Japan)

^b UNIVERSITY OF MASSACHUSETTS   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

ATRP; block copolymers; semifluorinated copolymers; thin films

Indexed keywords

ALTERNATING LAYERS; DIBLOCK COPOLYMER; ELECTRIC FIELD FORCE; FILM SURFACES; GRAZING INCIDENCE; INTERFACIAL INTERACTION; LAMELLAR MICRODOMAINS; LOW SURFACE ENERGY; MICRO-DOMAINS; PREFERENTIAL INTERACTION;

ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; ELECTRIC FIELDS; FREE RADICAL REACTIONS; INTERFACIAL ENERGY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; STYRENE; SURFACE CHEMISTRY; THIN FILMS;

ATOM TRANSFER RADICAL POLYMERIZATION;

EID: 81755165998     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.201100321     Document Type: Article

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