Fabrication of superhydrophobic surfaces on zinc substrates and their application as effective corrosion barriers

Applied Surface Science

Volumn 258, Issue 4, 2011, Pages 1359-1365

  Ning, Tao ^a   Xu, Wenguo ^a   Lu, Shixiang ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

Composite structures; Corrosion resistances; Superhydrophobic surfaces; Wettability

Indexed keywords

COMPOSITE STRUCTURES; CONTACT ANGLE; CORROSION RESISTANCE; CORROSION RESISTANT COATINGS; ELECTROCHEMICAL CORROSION; FABRICATION; HYDROPHOBICITY; PLATINUM; SODIUM CHLORIDE; SOLUTIONS; STRUCTURE (COMPOSITION); SURFACE PROPERTIES; SURFACE REACTIONS; SURFACE ROUGHNESS; WETTING; ZINC COATINGS;

ANTI-CORROSIVE COATINGS; DEPOSITION PROCESS; HIERARCHICAL STRUCTURES; POST-PROCESSING PROCEDURE; REACTION TEMPERATURE; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBICITY; WATER CONTACT ANGLE;

SUBSTRATES;

EID: 81555214061     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.09.064     Document Type: Article

References (54)

1. A.R. Parker, and C.R. Lawrence Nature 414 2001 33 34
2. H.Y. Erbil, A.L. Demirel, Y. Avci, and O. Mert Science 299 2003 1377 1380
3. W. Lee, M.K. Jin, W.C. Yoo, E.S. Jang, J.H. Choy, J.H. Kim, K. Char, and J.K. Lee Langmuir 20 2004 287 290
4. X. Wu, and G. Shi J. Phys. Chem. B 110 2006 11247 11252
5. H. Xia, X.F. Ga, and L. Jiang J. Am. Chem. Soc. 129 2007 1478 1479
6. X. Zhang, F. Shi, J. Niu, Y. Jiang, and Z. Wang J. Mater. Chem. 18 2008 621 633
7. X.Y. Song, J. Zhai, Y.L. Wang, and L. Jiang J. Phys. Chem. B 109 2005 4048 4052
8. E. Taffin de Givenchy, S. Amigoni, C. Martin, G. Andrada, L. Caillier, S. Geribaldi, and F. Guittard Langmuir 25 2009 6448 6453
9. M. Ma, R.M. Hill, J.L. Lowery, S.V. Fridrikh, and G.C. Rutledge Langmuir 21 2005 5549 5554
10. L. Jiang, Y. Zhao, and J. Zhai Angew. Chem. Int. Ed. 43 2004 4338 4341
11. L. Huang, S.P. Lau, H.Y. Yang, E.S.P. Leong, S.F. Yu, and S. Prawer J. Phys. Chem. B 109 2005 7746 7748
12. X. Zhang, F. Shi, X. Yu, H. Liu, Y. Fu, and Z.Q. Wang J. Am. Chem. Soc. 126 2004 3064 3065
13. V.G. Praig, G. Piret, M. Manesse, X. Castel, R. Boukherroub, and S. Szunerits Electrochim. Acta 53 2008 7838 7844
14. X.J. Feng, L. Feng, M.H. Jin, J. Zhai, L. Jiang, and D.B. Zhu J. Am. Chem. Soc. 126 2004 62 63
15. F. Shi, Z.Q. Wang, and X. Zhang Adv. Mater. 17 2005 1005 1009
16. N. Zhao, F. Shi, Z.Q. Wang, and X. Zhang Langmuir 21 2005 4713 4716
17. H.Q. Liu, S. Szunerits, M. Pisarek, W.G. Xu, and R. Boukherroub ACS Appl. Mater. Interfaces 1 2009 2086 2091
18. M.N. Qu, B.W. Zhang, S.Y. Song, L. Chen, J.Y. Zhang, and X.P. Cao Adv. Funct. Mater. 17 2007 593 596
19. I.A. Larmour, S.E.J. Bell, and G.C. Saunders Angew. Chem. Int. Ed. 46 2007 1710 1712
20. W.G. Xu, T. Ning, X.C. Yang, and S.X. Lu Appl. Surf. Sci. 257 2011 4801 4806
21. W. Song, J.J. Zhang, Y.F. Xie, Q. Cong, and B. Zhao J. Colloid Interface Sci. 329 2009 208 211
22. J.Y. Shiu, C.W. Kuo, P.L. Chen, and C.Y. Mou Chem. Mater. 16 2004 561 564
23. W. Ming, D. Wu, R. van Benthem, and G. de With Nano Lett. 5 2005 2298 2301
24. Y. Li, W.P. Cai, B.Q. Cao, G.T. Duan, F.Q. Sun, C.C. Li, and L.C. Jia Nanotechnology 17 2006 238 243
25. K. Ogawa, M. Soga, Y. Takada, and I. Nakayama Jpn. J. Appl. Phys. 32 1993 L614 L615
26. B.T. Qian, and Z.Q. Shen Langmuir 21 2005 9007 9009
27. K.K.S. Lau, J. Bico, K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, W.I. Milne, G.H. McKinley, and K.K. Gleason Nano Lett. 3 2003 1701 1705
28. H.J. Li, X.B. Wang, Y.L. Song, Y.Q. Liu, Q.S. Li, L. Jiang, and D.B. Zhu Angew. Chem. Int. Ed. 40 2001 1743 1746
29. T. Onda, S. Shibuichi, N. Satoh, and K. Tsujii Langmuir 12 1996 2125 2127
30. L.C. Gao, and T.J. McCarthy J. Am. Chem. Soc. 128 2006 9052 9053
31. N. Tian, Z.Y. Zhou, S.G. Sun, L. Cui, B. Ren, and Z.Q. Tian Chem. Commun. 2006 4090 4092
32. M.E. Abdelsalam, S. Mahajan, P.N. Bartlett, J.J. Baumberg, and A.E. Russell J. Am. Chem. Soc. 129 2007 7399 7406
33. M.N. Qu, G.Y. Zhao, Q. Wang, X.P. Cao, and J.Y. Zhang Nanotechnology 19 2008 055707 055712
34. M.C. Orilall, F. Matsumoto, Q. Zhou, H. Sai, H.D. Abruna, F.J. DiSalvo, and U. Wiesner J. Am. Chem. Soc. 131 2009 9389 9395
35. J.Y. Chen, B. Lim, E.P. Lee, and Y. Xia Nano Today 4 2009 81 95
36. Z.M. Peng, H.J. You, J.B. Wu, and H. Yang Nano Lett. 10 2010 1492 1496
37. W.C. Ye, J.X. Liu, Q.Z. Liu, F. Zhou, and W.M. Liu Electrochim. Acta 7 2010 75 81
38. K.X. Yao, and H.C. Zeng Langmuir 24 2008 14234 14244
39. T. Ning, W.G. Xu, and S.X. Lu J. Colloid Interface Sci. 361 2011 388 396
40. B. Wang, Z.-W. Lai, and C.B. Jiang J. Mater. Process. Technol. 74 1998 122 125
41. X.D. He, B. Meng, Y. Sun, B.C. Liu, and M.W. Li Appl. Surf. Sci. 254 2008 7159 7164
42. K.M. Hubbard, and B.F. Espinoza Thin Solid Films 366 2000 175 180
43. T. Ishizaki, J. Hieda, N. Saito, N. Saito, and O. Takai Electrochim. Acta 55 2010 7094 7101
44. F.C. Walsh, C. Ponce de León, C. Kerr, S. Court, and B.D. Barker Surf. Coat. Technol. 202 2008 5092 5102
45. M. Tsujikawa, S. Adachi, Y. Abe, S. Oki, K. Nakata, and M. Kamita Plasma Process. Polym. 4 2007 S593 S596
46. S.H. Cui, J.M. Han, Y.P. Du, and W.J. Li Surf. Coat. Technol. 201 2007 5306 5309
47. Z.P. Mao, J. Ma, J. Wang, and B.D. Sun Appl. Surf. Sci. 255 2009 3784 3788
48. V.H.V. Sarmento, M.G. Schiavetto, P. Hammer, A.V. Benedetti, C.S. Fugivara, P.H. Suegama, S.H. Pulcinelli, and C.V. Santilli Surf. Coat. Technol. 204 2010 2689 2701
49. H.W. Zhu, X.Y. Qu, Y. Hu, H. Xie, and Z.X. Chen Corros. Sci. 53 2011 481 486
50. Y. Yin, T. Liu, S. Chen, T. Liu, and S. Cheng Appl. Surf. Sci. 255 2008 2978 2984
51. T. Liu, S. Chen, S. Cheng, J. Tian, X. Chang, and Y. Yin Electrochim. Acta 52 2007 8003 8007
52. H.Q. Liu, S. Szunerits, W.G. Xu, and R. Boukherroub ACS Appl. Mater. Interfaces 1 2009 1150 1153
53. A.B.D. Cassie, and S. Baxter Trans. Faraday Soc. 40 1944 546 551
54. A.P. Yadav, A. Nishikata, and T.J. Tsuru Electroanal. Chem. 585 2005 142 149