Electro-optic activity of an azopolymer achieved via poling with the aid of silicon nitride insulating layer

Optica Applicata

Volumn 41, Issue 3, 2011, Pages 777-785

  Kozanecka Szmigiel, Anna ^a   Szmigiel, Dariusz ^b   Switkowski, Krzysztof ^a   Schab Balcerzak, Ewa ^c,d   Siwy, Mariola ^c  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

^c CENTRE OF POLYMER AND CARBON MATERIALS   (Poland)

^d UNIVERSITY OF SILESIA   (Poland)

Author keywords

Azopolymers; Electro optic activity; Polymer poling

Indexed keywords

AZO POLYMERS; AZOPOLYMER; CHEMICAL VAPOUR DEPOSITION; ELECTRO-OPTIC ACTIVITY; GUEST-HOST SYSTEMS; HIGH ELECTRIC FIELDS; HIGH RESISTIVITY; HIGH TRANSMITTANCE; INSULATING LAYERS; LOW TEMPERATURES; NITRIDE LAYERS; NONLINEAR OPTICAL CHROMOPHORE; PLASMA ENHANCEMENT; PMMA MATRICES; POLING PROCESS; POLYMER POLING; THIN POLYMER FILMS;

CHEMICAL VAPOR DEPOSITION; CHROMOPHORES; ELECTRIC FIELDS; INSULATING MATERIALS; INSULATION; PLASMA DEPOSITION; POLYMERS; SILICON NITRIDE;

POLYMER FILMS;

EID: 81255123404     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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