In situ electron beam irradiated rapid growth of bismuth nanoparticles in bismuth-based glass dielectrics at room temperature

Journal of Nanoparticle Research

Volumn 13, Issue 9, 2011, Pages 3599-3606

  Singh, Shiv Prakash ^a   Karmakar, Basudeb ^a  

^a CSIR CENTRAL GLASS AND CERAMIC RESEARCH INSTITUTE   (India)

Author keywords

Bismuth nanoparticles; Glass; Nano patterning; Transmission electron microscopy

Indexed keywords

AVERAGE PARTICLE SIZE; BISMUTH NANOPARTICLES; BISMUTH-BASED GLASS; EB IRRADIATION; ELECTRON BEAM IRRADIATION; IN-SITU; IN-SITU CONTROL; IN-SITU TEM; IRRADIATION TIME; LOW MELTING TEMPERATURES; NANOPATTERNING; OTHER APPLICATIONS; RAPID GROWTH; RHOMBOHEDRAL STRUCTURES; ROOM TEMPERATURE; SELECTED AREA ELECTRON DIFFRACTION; STRUCTURAL CHANGE; TRANSMISSION ELECTRON;

BISMUTH; ELECTRON BEAMS; ELECTRON DIFFRACTION; ELECTRONS; GLASS; IRRADIATION; MELTING POINT; NANOPARTICLES; PHASE TRANSITIONS; TRANSMISSION ELECTRON MICROSCOPY;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

BISMUTH; GLASS;

ARTICLE; CHEMICAL STRUCTURE; ELECTRICAL PARAMETERS; ELECTRON BEAM; ELECTRON DIFFRACTION; GROWTH REGULATION; IRRADIATION; MELTING POINT; PARTICLE SIZE; PRIORITY JOURNAL; ROOM TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 81055156305     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-011-0468-y     Document Type: Article

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