Deposition of doped TiO2 thin film by sol gel technique and its characterization: A review

Proceedings of the World Congress on Engineering 2011, WCE 2011

Volumn 2, Issue , 2011, Pages 1500-1503

  Gaur, A M ^a   Joshi, Rajat ^b   Kumar, Mukesh ^c  

^a Electrical Engineering Department   (India)

^b Electronics and Communication Department   (India)

^c KURUKSHETRA UNIVERSITY   (India)

Author keywords

Band gap; Doping; Grain size; Sol gel; Thin films; Titanium dioxide (TiO2); XRD

Indexed keywords

ABSORPTION EDGES; ANATASE TIO; ANNEALING PROCESS; DEPOSITED FILMS; DOPED-TIO; DOPING CONCENTRATION; DOPING MATERIALS; GRAIN SIZE; PREPARATION METHOD; SELF CLEANING GLASS; SOL-GEL SPIN COATING; SOL-GEL TECHNIQUE; SOLAR PANELS; SURFACE PROFILOMETERS; THIN FILMS DEPOSITION; TIO; VISIBLE LIGHT REGION; WIDE AREA; XRD;

ABSORPTION SPECTROSCOPY; COATINGS; DEPOSITION; FILM PREPARATION; GELS; OXIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOL-GEL PROCESS; SOL-GELS; SOLS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROSCOPY; ULTRAVIOLET VISIBLE SPECTROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION;

SEMICONDUCTOR DOPING;

EID: 80755150260     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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