69.2: Highly reliable oxide-semiconductor TFT for AM-OLED display

48th Annual SID Symposium, Seminar, and Exhibition 2010, Display Week 2010

Volumn 2, Issue , 2010, Pages 1033-1036

  Arai, Toshiaki ^a   Morosawa, Narihiro ^a   Tokunaga, Kazuhiko ^a   Terai, Yasuhiro ^a   Fukumoto, Eri ^a   Fujimori, Takashige ^a   Nakayama, Tetsuo ^a   Yamaguchi, Takashi ^a   Sasaoka, Tatsuya ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AM-OLED; DEVICE RELIABILITY; LARGE SIZES; MASS PRODUCTION; OXIDE SEMICONDUCTOR; PASSIVATING FILMS; ULTRA-HIGH;

LIQUID CRYSTAL DISPLAYS; PASSIVATION;

THIN FILM TRANSISTORS;

EID: 80755130174     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. T. Sasaoka, et al., "A 13.0-inch AM-OLED Display with Top Emitting Structure and Adaptive Current Mode Programmed Pixel Circuit (TAC)", SID '01 Digest, p.384 (2001).
2. Y.-J. Chang, et al., "World's Largest (21.3 in.) UXGA Non-Laser LTPS AMLCD", SID '06, p. 1276 (2006).
3. T. Arai, et al., "Micro Silicon Technology for Active Matrix OLED Display", SID '07, p. 1370 (2007).
4. R. Hayashi, et al., "Improved Amorphous In-Ga-Zn-O TFTs", SID '08, p. 621 (2008).
5. S.-H. K. Park, et al., "Effect of Channel/Insulator Interface Formation Process on the Oxide TFT Performance", SID ' 09, p. 276 (2009).
6. J.-S. Park, et al., "Amorphous Indium-Gallium-Zinc Oxide TFTs and Their Application for Large Size AMOLED", AM-FPD '08, p. 275 (2008).