Patterning of polymer-encapsulated optical oxygen sensors by electron beam lithography

ICONN 2010 - Proceedings of the 2010 International Conference on Nanoscience and Nanotechnology

Volumn , Issue , 2010, Pages 237-240

  Nock, Volker ^a   Murray, Lynn M ^a   Alkaisi, Maan M ^a   Blaikie, Richard J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

E beam lithography; O2 sensor; PtOEPK PS

Indexed keywords

E-BEAM LITHOGRAPHY; FABRICATION PROCESS; FEATURE SIZES; GASEOUS OXYGEN; INTENSITY RATIO; METAL LAYER; OPTICAL OXYGEN SENSORS; OXYGEN-SENSING; PATCH ARRAYS; PROCESS USE; PTOEPK/PS; SENSOR MATERIALS; SENSOR READOUT; SINGLE CELLS; STERN-VOLMER; SUBMICRON; WAFER LEVEL;

CELL CULTURE; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; NANOSCIENCE; OPTICAL SYSTEMS; OXYGEN; OXYGEN SENSORS;

SENSORS;

EID: 80555157629     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICONN.2010.6045186     Document Type: Conference Paper

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