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Volumn 258, Issue 3, 2011, Pages 1256-1260

Enhanced dielectric permittivity in poly (vinylidene) fluoride/multiwalled carbon nanotubes nanocomposite thin films fabricated by pulsed laser deposition

(3) Chanmal, Chetan a Deo, Meenal a Jog, Jyoti a

a NATIONAL CHEMICAL LABORATORY (India)

Author keywords

Dielectric permittivity; Ferroelectric polymer; Percolation threshold; Pulsed laser deposition; Thin films

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; FABRICATION; FERROELECTRIC FILMS; FERROELECTRICITY; FLUORINE COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOCOMPOSITE FILMS; NANOCOMPOSITES; PERCOLATION (COMPUTER STORAGE); PERCOLATION (FLUIDS); PERMITTIVITY; POLYMER FILMS; PULSED LASER DEPOSITION; PULSED LASERS; SOLVENTS; THIN FILMS; X RAY DIFFRACTION; YARN;

DIELECTRIC ANALYSIS; DIELECTRIC PERMITTIVITIES; FERROELECTRIC POLYMERS; NANOCOMPOSITE THIN FILMS; PERCOLATION THRESHOLDS; POLY(VINYLIDENE FLUORIDE); PULSED-LASER DEPOSITION TECHNIQUE; UNIFORM DISPERSIONS;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 80455160261 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.09.087 Document Type: Article

Times cited : (16)

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