Substrate suppression of thermal roughness in stacked supported bilayers

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 84, Issue 4, 2011, Pages

  Decaro, Curt M ^a   Berry, Justin D ^a,e   Lurio, Laurence B ^a   Ma, Yicong ^b   Chen, Gang ^b   Sinha, Sunil ^b   Tayebi, Lobat ^c   Parikh, Atul N ^c   Jiang, Zhang ^d   Sandy, Alec R ^d  

^a NORTHERN ILLINOIS UNIVERSITY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d ARGONNE NATIONAL LABORATORY   (United States)

^e BOSTON UNIVERSITY SCHOOL OF MEDICINE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; DENSITY PROFILE; FLAT SUBSTRATES; LATERAL FLUCTUATIONS; LAYER SPACINGS; MULTI-LAYER SYSTEM; PHOSPHATIDYLETHANOLAMINE; SILICON SUBSTRATES; X RAY REFLECTIVITY;

SUBSTRATES;

EID: 80054896150     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.84.041914     Document Type: Article

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