Method for patterning various nanomaterials: Electrochemical deposition of patterned Ni thin films and their utilization as a strippable mask

ACS Applied Materials and Interfaces

Volumn 3, Issue 6, 2011, Pages 2108-2111

  Ogihara, Hitoshi ^a   Fukasawa, Masaru ^a   Saji, Tetsuo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Carbon nanotubes; Electrodeposition; Metal metal oxide interface; Micropatterning; Nanoparticles

Indexed keywords

CONVENTIONAL PHOTOLITHOGRAPHY; DROP-CAST; ELECTROCHEMICAL DEPOSITION; INDIUM THIN OXIDES; KEY PROCESS; METAL-METAL OXIDE INTERFACE; MICRO PATTERNING; NANOMATERIAL; NI THIN FILMS; TIO;

CARBON NANOTUBES; DEPOSITION; ELECTRODEPOSITION; METALLIC COMPOUNDS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; PHOTORESISTS; REDUCTION; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION;

CARBON FILMS;

CARBON NANOTUBE; NANOMATERIAL; NANOPARTICLE; NICKEL;

ARTICLE; CHEMISTRY; ELECTROCHEMISTRY; ELECTROPLATING INDUSTRY; METHODOLOGY;

ELECTROCHEMISTRY; ELECTROPLATING; NANOPARTICLES; NANOSTRUCTURES; NANOTUBES, CARBON; NICKEL;

EID: 80054788626     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am200325b     Document Type: Article

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