SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 258, Issue 1, 2011, Pages 201-206

Formation of CuO nanowires by thermal annealing copper film deposited on Ti/Si substrate

(6) Wang, Yao a Shen, Ruiqi a Jin, Xiaoyun a Zhu, Peng a Ye, Yinghua a Hu, Yan a

a NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

Author keywords

CuO nanowires; Electron beam evaporation; Growth mechanism; Thermal annealing

Indexed keywords

ANNEALING; COPPER; ELECTRON BEAMS; EVAPORATION; FILM GROWTH; METALLIC FILMS; NANOWIRES; OXIDE FILMS; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMOOXIDATION; THIN FILMS; TITANIUM COMPOUNDS;

ANNEALING TEMPERATURES; CUO NANOWIRES; ELECTRON BEAM EVAPORATION; GROWTH MECHANISMS; INORGANIC MATERIALS; STRUCTURE CHARACTERIZATION; THERMAL-ANNEALING; VAPOR SOLID MECHANISM;

COPPER OXIDES;

EID: 80054754241 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.08.031 Document Type: Article

Times cited : (39)

References (22)

1
- 0000160980
- S. Iijima Nature 56 1991 354
- (1991) Nature , vol.56 , pp. 354
- Iijima, S.¹

2
- 0037418379
- Y. Xia, P. Yang, Y. Sun, Y. Wu, B. Mayers, B. Gates, Y. Yin, F. Kim, and H. Yan Adv. Mater. 15 2003 353
- (2003) Adv. Mater. , vol.15 , pp. 353
- Xia, Y.¹ Yang, P.² Sun, Y.³ Wu, Y.⁴ Mayers, B.⁵ Gates, B.⁶ Yin, Y.⁷ Kim, F.⁸ Yan, H.⁹

3
- 70449707128
- N. Duc Hoa, N. Van Quy, M.A. Tuan, and N. Van Hieu Physica E 42 2009 146
- (2009) Physica e , vol.42 , pp. 146
- Duc Hoa, N.¹ Van Quy, N.² Tuan, M.A.³ Van Hieu, N.⁴

4
- 0032508937
- J.B. Reitz, and E.I. Solomon J. Am. Chem. Soc. 120 1998 11467
- (1998) J. Am. Chem. Soc. , vol.120 , pp. 11467
- Reitz, J.B.¹ Solomon, E.I.²

5
- 80054766273
- G. Larsen, and S. Noriega Appl. Catal. A 73 2004 278
- (2004) Appl. Catal. A , vol.73 , pp. 278
- Larsen, G.¹ Noriega, S.²

6
- 0034727086
- P. Poizot, S. Laruelle, S. Grugeon, L. Dupont, and J. Taracon Nature 407 2000 496
- (2000) Nature , vol.407 , pp. 496
- Poizot, P.¹ Laruelle, S.² Grugeon, S.³ Dupont, L.⁴ Taracon, J.⁵

7
- 34250764017
- C. Rossi, K. Zhang, D. Estve, P. Alphonse, J.Y.C. Ching, P. Tailhades, and C. Vahlas J. Microelectromech. Syst. 16 2007 919
- (2007) J. Microelectromech. Syst. , vol.16 , pp. 919
- Rossi, C.¹ Zhang, K.² Estve, D.³ Alphonse, P.⁴ Ching, J.Y.C.⁵ Tailhades, P.⁶ Vahlas, C.⁷

8
- 34548685636
- K. Zhang, C. Rossi, G.A.A. Rodriguez, C. Tenailleau, and P. Alphonse Appl. Phys. Lett. 91 2007 113117
- (2007) Appl. Phys. Lett. , vol.91 , pp. 113117
- Zhang, K.¹ Rossi, C.² Rodriguez, G.A.A.³ Tenailleau, C.⁴ Alphonse, P.⁵

9
- 74349123013
- M. Petrantoni, C. Rossi, V. Conedera, D. Bourrier, P. Alphonse, and C. Tenailleau J. Phys. Chem. Solids 71 2010 80
- (2010) J. Phys. Chem. Solids , vol.71 , pp. 80
- Petrantoni, M.¹ Rossi, C.² Conedera, V.³ Bourrier, D.⁴ Alphonse, P.⁵ Tenailleau, C.⁶

10
- 0037643281
- C. Hsieh, J. Chen, H. Lin, and H. Shih Appl. Phys. Lett. 82 2003 3316
- (2003) Appl. Phys. Lett. , vol.82 , pp. 3316
- Hsieh, C.¹ Chen, J.² Lin, H.³ Shih, H.⁴

11
- 0037146161
- C. Xu, Y. Liu, G. Xu, and G. Wang Mater. Res. Bull. 37 2002 2365
- (2002) Mater. Res. Bull. , vol.37 , pp. 2365
- Xu, C.¹ Liu, Y.² Xu, G.³ Wang, G.⁴

12
- 77956135823
- K.M. Shrestha, C.M. Sorensen, and K.J. Klabunde J. Phys. Chem. C 114 2010 14368
- (2010) J. Phys. Chem. C , vol.114 , pp. 14368
- Shrestha, K.M.¹ Sorensen, C.M.² Klabunde, K.J.³

13
- 77949891680
- N. Duc Hoa, N. Van Quy, H. Jung, D. Kim, H. Kim, and S. Hong Sens. Actuators B 146 2010 266
- (2010) Sens. Actuators B , vol.146 , pp. 266
- Duc Hoa, N.¹ Van Quy, N.² Jung, H.³ Kim, D.⁴ Kim, H.⁵ Hong, S.⁶

14
- 10244256461
- A. Kumar, A.K. Srivastava, P. Tiwari, and R.V. Nandedkar J. Phys.: Condens. Matter 16 2004 8531
- (2004) J. Phys.: Condens. Matter , vol.16 , pp. 8531
- Kumar, A.¹ Srivastava, A.K.² Tiwari, P.³ Nandedkar, R.V.⁴

15
- 0346742503
- X. Jiang, T. Herricks, and Y. Xia Nano Lett. 2 12 2002 1333
- (2002) Nano Lett. , vol.2 , Issue.12 , pp. 1333
- Jiang, X.¹ Herricks, T.² Xia, Y.³

16
- 77955515868
- J. Liang, N. Kishi, T. Soga, and T. Jimbo Appl. Surf. Sci. 257 2010 62 66
- (2010) Appl. Surf. Sci. , vol.257 , pp. 62-66
- Liang, J.¹ Kishi, N.² Soga, T.³ Jimbo, T.⁴

17
- 40749143139
- J.T. Chen, F. Zhang, J. Wang, G.A. Zhang, B.B. Miao, X.Y. Fan, D. Yan, and P.X. Yan J. Alloys Compd. 454 2008 268
- (2008) J. Alloys Compd. , vol.454 , pp. 268
- Chen, J.T.¹ Zhang, F.² Wang, J.³ Zhang, G.A.⁴ Miao, B.B.⁵ Fan, X.Y.⁶ Yan, D.⁷ Yan, P.X.⁸

18
- 34250757563
- K. Zhang, C. Rossi, C. Tenailleau, P. Alphonse, and J. Chane-Ching Nanotechnology 18 2007 275607
- (2007) Nanotechnology , vol.18 , pp. 275607
- Zhang, K.¹ Rossi, C.² Tenailleau, C.³ Alphonse, P.⁴ Chane-Ching, J.⁵

19
- 79951682989
- M.L. Zhong, D.C. Zeng, Z.W. Liu, H.Y. Yu, X.C. Zhong, and W.Q. Qiu Acta Mater. 58 2010 5926-5923
- (2010) Acta Mater. , vol.58 , pp. 5926-5923
- Zhong, M.L.¹ Zeng, D.C.² Liu, Z.W.³ Yu, H.Y.⁴ Zhong, X.C.⁵ Qiu, W.Q.⁶

20
- 79951677805
- L. Yuan, Y. Wang, R. Mema, and G. Zhou Acta Mater. 59 2011 2491 2500
- (2011) Acta Mater. , vol.59 , pp. 2491-2500
- Yuan, L.¹ Wang, Y.² Mema, R.³ Zhou, G.⁴

21
- 69149106102
- A.M.B. Goncalves, L.C. Campos, A.S. Ferlauto, and R.G. Lacerda J. Appl. Phys. 106 2009 034303
- (2009) J. Appl. Phys. , vol.106 , pp. 034303
- Goncalves, A.M.B.¹ Campos, L.C.² Ferlauto, A.S.³ Lacerda, R.G.⁴

22
- 33644850928
- M. Kaur, K.P. Muthe, S.K. Despanda, S. Choudhury, J.B. Singh, N. Verma, S.K. Gupta, and J.V. Yakhmi J. Cryst. Growth 289 2006 670
- (2006) J. Cryst. Growth , vol.289 , pp. 670
- Kaur, M.¹ Muthe, K.P.² Despanda, S.K.³ Choudhury, S.⁴ Singh, J.B.⁵ Verma, N.⁶ Gupta, S.K.⁷ Yakhmi, J.V.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.