Functional properties of nickel cobalt oxide thin films

Thin Solid Films

Volumn 520, Issue 1, 2011, Pages 651-655

  Iacomi, F ^a   Calin, G ^a   Scarlat, C ^b   Irimia, M ^a   Doroftei, C ^a   Dobromir, M ^a   Rusu, G G ^a   Iftimie, N ^c   Sandu, A V ^d  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c NATIONAL INSTITUTE OF RESEARCH AND DEVELOPMENT FOR TECHNICAL PHYSICS   (Romania)

^d GHEORGHE ASACHI TECHNICAL UNIVERSITY OF IASI   (Romania)

Author keywords

Electrical properties; Gas sensor; Magnetic properties; Spinel structure

Indexed keywords

CO PARTICLES; COBALT-NICKEL; FOUR-PROBE MEASUREMENT; FUNCTIONAL PROPERTIES; GAS SENSOR; GLASS SLIDES; INSULATOR METAL TRANSITION; MAGNETORESISTANCE RATIO; NANOCRYSTALLINE SPINELS; NICKEL COBALT OXIDES; SENSING PROPERTY; SPIN-COATING METHOD; SPINEL PHASE; SPINEL STRUCTURE; STRUCTURE AND MORPHOLOGY;

COBALT; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; ETHANOL; MAGNETIC PROPERTIES; METAL INSULATOR TRANSITION; NICKEL COATINGS; NICKEL OXIDE; SPIN GLASS; STOICHIOMETRY; STRUCTURAL PROPERTIES; THIN FILMS;

OXIDE FILMS;

EID: 80054017438     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.067     Document Type: Article

References (22)

1. K. Domansky, A. Rose, W.H. Gover, and G.J. Exarhos Mater. Sci. Eng. B-Solid 76 2000 16
2. S. Goodwin-Johansson, P.H. Holloway, G. McGuire, L. Buckley, R. Cozzens, R. Schwartz, and G.J. Exarhos Proc. SPIE 3967 2000 225
3. J.F. Marco, J.R. Gancedo, J. Ortiz, and J.L. Gautier Appl. Surf. Sci. 227 2004 175
4. G.J. Exarhos, A. Rose, and C.F. Windisch Jr. Thin Solid Films 308-309 1997 56
5. C.F. Windisch Jr., K.F. Ferris, and G.J. Exarhos J. Vac. Sci. Technol. A 19 2001 1647
6. C.F. Windisch Jr., G.J. Exarhos, and S.K. Sharma J. Appl. Phys. 92 2002 5572
7. H. Haenen, W. Visscher, and E. Barendrecht J. Electroanal. Chem. 208 1986 297
8. Y.E. Roginskaya, O.V. Morozova, E.N. LubnY.E. Ulitina, G.V. Lopukhova, and S. Trasatti Langmuir 13 1997 4621
9. C.C. Hu, and C.Y. Cheng Electrochem. Solid State 5 2002 43
10. S. Holgersson, and A. Karlsson Z. Anorg. Allg. Chem. 183 1929 384
11. E. Rios, H. Nguyen-Cong, J.F. Marco, J.R. Gancedo, P. Chartier, and J.L. Gautier Electrochim. Acta 45 2000 4431
12. J. Ortiz, M. Puelma, and J.L. Gautier J. Chil. Chem. Soc. 48 2003 67
13. G. CalM. Irimia, C. Scarlat, M. Purica, F. Comanescu, and F. Iacomi CAS 2010 Proceedings 2010 387
14. F. Zhang, S.W. Chan, J.E. Spanier, E.A. Qiang JR.D. Robinson, and I.I. Herman Appl. Phys. Lett. 80 2002 127
15. S. Tsunekawa, K. Ishikawa, Z.Q. Li, Y. Kawazoe, and A. Kasuya Phys. Rev. Lett. 85 2000 3440
16. A. Chatterjee, and D. Chakravorty Appl. Phys. Lett. 60 1992 138
17. B.D. Cullity Elements of X-ray Diffraction 2nd ed 1978 Addison-Wesley, Reading 99
18. J.G. Kim, D.L. Pugmire, D. Battaglia, and M.A. Langell Appl. Surf. Sci. 165 2000 70
19. Y.P. Fu Mater. Chem. Phys. 115 2009 334
20. G. Martinelli, M.C. Carotta, M. Ferroni, Y. Sadaoka, and E. Traversa Sensor Actuat. B-Chem. 55 1999 99
21. K. Arshak, and I. Gaidan Thin Solid Films 495 2006 286
22. Y. Wang, J. Chen, and X. Wu Mater. Lett. 49 2001 361