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Volumn 345, Issue , 2012, Pages 87-92
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Effects of N-doped quantity and current density on properties of TiO 2 films by arc ion plating
a
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Author keywords
Arc ion plating; Current density; N doped quantity; TiO2
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Indexed keywords
ABSORPTION EDGES;
ANNEALING TREATMENTS;
ARC ION PLATING;
CATALYTIC PERFORMANCE;
CATALYTIC PROPERTIES;
EXPERIMENTAL CONDITIONS;
FILM STRUCTURE;
MEDICAL GLASS;
METHYL ORANGE;
N-DOPED;
N-DOPED QUANTITY;
N-DOPED TIO;
PHOTO-CATALYTIC;
TIO;
TIO2;
XRD;
AZO DYES;
CURRENT DENSITY;
INTELLIGENT MATERIALS;
ION IMPLANTATION;
IONS;
MEDICAL NANOTECHNOLOGY;
NANOTECHNOLOGY;
OPTICAL PROPERTIES;
OXIDE MINERALS;
PRESSURE EFFECTS;
SURFACE STRUCTURE;
TITANIUM DIOXIDE;
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EID: 80053602865
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/AMR.345.87 Document Type: Conference Paper |
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Times cited : (2)
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References (10)
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