Nanoscale, catalytically enhanced local oxidation of silicon-containing layers by 'burrowing' Ge quantum dots

Nanotechnology

Volumn 22, Issue 43, 2011, Pages

  Chien, Chung Yen ^a   Chang, Yu Jui ^a   Chen, Kuan Hung ^a   Lai, Wei Ting ^a   George, Tom ^b   Scherer, Axel ^c   Li, Pei Wen ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b Zyomed Corporation   (United States)

^c California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GE QUANTUM DOT; LOCAL OXIDATION; LOCALIZED OXIDATION; NANO SCALE; TWO-STEP MECHANISMS;

DISSOLUTION; GERMANIUM; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OXIDATION; SEMICONDUCTOR QUANTUM DOTS; SILICON;

SILICON OXIDES;

EID: 80053556285     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/43/435602     Document Type: Article

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