AC impedance and cyclic voltammetry studies on PbS semiconducting film prepared by electrodeposition

Journal of Electroanalytical Chemistry

Volumn 661, Issue 1, 2011, Pages 265-269

  Aghassi, A ^a   Jafarian, M ^a   Danaee, I ^b   Gobal, F ^c   Mahjani, M G ^a  

^a K N TOOSI UNIVERSITY OF TECHNOLOGY   (Iran)

^b PETROLEUM UNIVERSITY OF TECHNOLOGY   (Iran)

^c SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Equivalent circuit; Flat band potential; Impedance spectroscopy; Lead sulfide; Mott Schottky plot

Indexed keywords

BIOELECTRIC PHENOMENA; CARRIER CONCENTRATION; DISSOLUTION; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMICAL PROPERTIES; ELECTRODES; EQUIVALENT CIRCUITS; HYDROGEN; SODIUM; STAINLESS STEEL; SULFUR;

AC-IMPEDANCE; AG/AGCL; CATHODIC REDUCTIONS; CONSTANT PHASE ELEMENT; ELECTRODE SURFACES; FLAT BAND POTENTIAL; FREQUENCY DISPERSION; HYDROGEN EVOLUTION; IMPEDANCE SPECTROSCOPY; IMPEDANCE SPECTRUM; INTERFACIAL CAPACITANCE; LEAD SULFIDE; MOTT-SCHOTTKY PLOTS; OXIDATIVE DISSOLUTION; P TYPE SEMICONDUCTOR; ROOM TEMPERATURE; VOLTAMMETRIC;

CYCLIC VOLTAMMETRY;

EID: 80053328546     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2011.08.012     Document Type: Article

References (49)

1. S. Kumar, Z.H. Khan, M.A. Majeed Khan, and M. Husain Curr. Appl. Phys. 5 2005 561 566
2. L. Bakueva, I. Gorelikov, S. Musikhin, X.S. Zhao, E.H. Sargent, and E. Kumacheva Adv. Mater. 16 2004 926 929
3. H. Hirata, and K. Higashiyama Bull. Chem. Soc. Jpn. 44 1971 2420 2423
4. P.K. Nair, O. Gomezdaza, and M.T.S. Nair Adv. Mater. Opt. Electron. 1 1992 139 145
5. P.K. Nair, V.M. Garcia, A.B. Hernandez, and M.T.S. Nair J. Phys. D: Appl. Phys. 24 1991 1466 1472
6. J.J. Valenzuela-Jauregui, R. Ramirez-Bon, A. Mendoza-Galvan, and M. Sotelo-Lerma Thin Solid Films 441 2003 104 110
7. M. Ichimura, T. Narita, and K. Masui Mater. Sci. Eng. B. 96 2002 296 299
8. E. Nykänen, J. Laine-Ylijoki, P. Soininen, L. Niinistö, M. Leskelä, and L.G. Hubert-Pfalzgraf J. Mater. Chem. 4 1994 1409 1412
9. T. Kanniainen, S. Lindroos, J. Ihanus, and M. Leskelä J. Mater. Chem. 6 1996 161 164
10. M. Takahashi, Y. Ohshima, K. Nagata, and S. Furuta J. Electroanal. Chem. 359 1993 281 286
11. M. Sharon, K.S. Ramaiah, M. Kumar, M. Neumann-Spallart, and C. Levy-Clement J. Electroanal. Chem. 436 1997 49 52
12. B. Scharifker, Z. Ferreira, and J. Mozota Electrochim. Acta 30 1985 677 682
13. M. Alanyalioglu, F. Bayrakceken, and Ü. Demir Electrochim. Acta 54 2009 6554 6559
14. H. Saloniemi, M. Ritala, M. Leskelä, and R. Lappalainen J. Electrochem. Soc. 146 1999 2522 2525
15. I.M. Dharmadasaz, and J. Haigh J. Electrochem. Soc. 153 2006 G47 G52
16. J.R. MacDonald, and E. Barsoukov Impedance Spectroscopy, Theory, Experiments and Application 2nd ed. 2005 John Wiley & Sons New Jersey
17. R. Memming Semiconductor Electrochemistry 2001 Wiley-VCH Verlag GmbH Weinheim
18. N. Sato Electrochemistry at Metal and Semiconductor Electrodes 1998 Elsevier Science Amsterdam
19. P. Velásquez, H. Gómez, D. Leinen, and J.R. Ramos-Barrado Colloids Surf. A 140 1998 177 182
20. W.P. Gomes, and F. Cardon Prog. Surf. Sci. 12 1982 155 216
21. W.P. Gomes, and D. Vanmaekelbergh Electrochim. Acta 41 1996 967 973
22. J.N. Chazalviel Electrochim. Acta 35 1990 1545 1552
23. A. Natarajan, G. Oskam, and P.C. Searson J. Phys. Chem. B 102 1998 7793 7799
24. A.J. Nozik, and R. Memming J. Phys. Chem. 100 1996 13061 13078
25. Z. Hens, and W.P. Gomes Phys. Chem. Chem. Phys. 1 1999 3607 3615
26. A.M. Van Wezemael, W.H. Laflere, F. Cardon, and W.P. Gomes J. Electroanal. Chem. 87 1978 105 109
27. P. Herrasti, E. Fatas, J. Herrero, and J. Ortega Electrochim. Acta 35 1990 345 349
28. M. Radecka, M. Wierzbicka, and M. Rekas Phys. B 351 2004 121 128
29. J.R. Macdonald Solid State Ionics 13 1984 147 149
30. M. Jafarian, F. Gobal, I. Danaee, and M.G. Mahjani Electrochim. Acta 55 2010 2093 2100
31. E. Jacobsen, and D.T. Sawyer J. Electroanal. Chem. 15 1967 181 192
32. M.J. Nicol, R.L. Paul, J.W. Diggle, and A.P. Saunders Electrochim. Acta 23 1977 625 633
33. S. Ogawa, K. Hu, F.F. Fan, and A.J. Bard J. Phys. Chem. B 101 1997 5707 5711
34. A.P. Davis, and C.P. Huang Langmuir 7 1991 803 808
35. J.R. Gardner, and R. Woods J. Electroanal. Chem. 100 1979 447 459
36. H. Saloniemi, M. Kemell, M. Ritala, and M. Leskelä Thin Solid Films 386 2001 32 40
37. M.J. Nicol, R.L. Paul, and J.W. Diggle Electrochim. Acta 23 1977 635 639
38. A. Goossens, and J. Schoonman J. Electrochem. Soc. 139 1992 893 900
39. E.C. Dutoit, R.L. Van Meirhaeghe, F. Cardon, and W.P. Gomes Ber. Bunsenges. Phys. Chem. 79 1975 1206 1213
40. G. Nogami J. Electrochem. Soc. 129 1982 2219 2223
41. G. Oskam, D. Vanmaekelbergh, and J.J. Kelly J. Electroanal. Chem. 315 1991 65 85
42. Y.B. Wang, R.K. Yuan, and M. Wilander Appl. Phys. A: Mater. Sci. Process. 63 1996 481 486
43. Z. Hens, and W.P. Gomes Phys. Chem. Chem. Phys. 1 1999 3617 3625
44. S.S. Kocha, and B.E. Liebert Electrochim. Acta 38 1993 1993 1997
45. S. Mahmoud, and O. Hamid Fizika A (Zagreb) 10 2001 21 30
46. M. Leskela, L. Niinisto, P. Niemelat, E. Nykainen, P. Soininen, M. Tiitta, and J. Vahakangas Vacuum 41 1990 1457 1459
47. J. George, T.I. Palson, and K.S. Joseph Solid State Commun. 58 1986 605 608
48. V. Stancu, E. Pentia, A. Goldenblum, M. Buda, G. Iordache, and T. Botila Rom. J. Inform. Sci. Technol. 10 2007 53 66
49. R.K. Joshi, A. Kanjilal, and H.K. Sehgal Appl. Surf. Sci. 221 2004 43 47