A lamination micromixier using silicon DRIE technology

NEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Volumn , Issue , 2011, Pages 650-653

  Ishikawa, Kazuki ^a   Saito, Takeshi ^a   Takahashi, Kazuhiro ^a   Ishida, Makoto ^a   Sawada, Kazuaki ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

DRIE; lamination micromixer; microfluidics

Indexed keywords

DRIE; DRIE PROCESS; DRIE TECHNOLOGY; FLOW LAYERS; MICRO MIXERS; MICRO-HEATERS; MIXING EFFICIENCY; SUBCHANNELS; TEMPERATURE CONTROL CIRCUIT; THERMAL SENSORS; VOLUME RATIO;

FABRICATION; MICROFLUIDICS; MIXERS (MACHINERY); MIXING; PHOTORESISTS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS;

LAMINATING;

EID: 80053318121     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2011.6017439     Document Type: Conference Paper

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