Enhancing the performance of poly(3-methylthiophene)-based electrochromic devices via insertion of a TiO2 buffer layer

Journal of Electroanalytical Chemistry

Volumn 661, Issue 1, 2011, Pages 113-119

  Yang, Chien Hsin ^a   Lo, Yu Chun ^a   Huang, Po Ling ^a   Lin, Chun Chu ^a   Wu, Kai Ming ^a   Wang, Tzong Liu ^a   Shieh, Yeong Tarng ^a   Chen, Wen Janq ^a  

^a NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

Author keywords

Buffer layer; Electrochromic device; Mesoporous film; Poly(3 methylthiophene); Titanium dioxide

Indexed keywords

ADHESION; BUFFER LAYERS; COMPOSITE FILMS; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; ELECTRODES; EQUIPMENT; ITO GLASS; MESOPOROUS MATERIALS; OXIDE FILMS; POLYMERS; SPIN GLASS; SUBSTRATES; TIN; TIN DIOXIDE; TIN OXIDES; TITANIUM;

COMPOSITE ELECTRODE; CONDUCTIVE POLYMER; ELECTROCHROMIC ELECTRODES; ELECTROCHROMICS; GLASS SUBSTRATES; INDIUM TIN OXIDE; ITO ELECTRODES; LONG TERM STABILITY; MESOPOROUS FILMS; MESOPOROUS TIO; OPTICAL CONTRAST; POLY (3-METHYLTHIOPHENE); TIO;

TITANIUM DIOXIDE;

EID: 80053302858     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2011.07.023     Document Type: Article

References (16)

1. S.K. Deb Appl. Opt. 8 1969 192
2. A.F. Diaz, US Patent 4304465, 1981.
3. R.R. Benkeser, and R.B. Currie J. Am. Chem. Soc. 70 1948 1780
4. T. Yamamoto, K. Sanechika, and A. Morita J. Polym. Sci. Polym. Lett. 18 1980 9
5. R.J. Waltman, J. Bargon, and A.F. Diaz J. Phys. Chem. 87 1983 1459
6. G. Tourillon, and F. Garnier J. Phys. Chem. 87 1983 2289
7. A. Corradini, A.M. Marinangeli, and M. Mastragostino Electrochim. Acta 35 1990 1757
8. S. Alkan, C.A. Cutler, and J.R. Reynolds Adv. Funct. Mater. 13 2003 311
9. S.W. Huang, and K.C. Ho Sol. Energy Mater. Sol. Cells 90 2006 491
10. C.H. Yang, H.L. Chen, C.P. Chen, S.H. Liao, H.A. Hsiao, Y.Y. Chuang, H.S. Hsu, T.L. Wang, Y.T. Shieh, L.Y. Lin, and Y.C. Tsai J. Electroanal. Chem. 590 2006 161
11. C.H. Yang, S.J. Liu, C.C. Chang, and L.Y. Lin J. Electroanal. Chem. 590 2006 161
12. D. Cummins, G. Boschloo, M. Ryan, D. Corr, S.N. Rao, and D. Fitzmaurice J. Phys. Chem. B 104 2000 11449
13. S.A. Sapp, G.A. Sotzing, and J.R. Renolds Chem. Mater. 10 1998 2101
14. D.E. Labaye, C. Jerome, V.M. Geskin, P. Louette, R. Martinot, and R. Jerome Langmuir 18 2002 5222
15. W. Lu, A.G. Fadeev, B. Qi, E. Smela, B.R. Mattes, J. Ding, G.M. Spinks, J. Mazurkiewicz, D. Zhou, G.G. Wallace, D.R. MacFarlane, S. Forsyth, and A.M. Forsyth Science 297 2002 983
16. B. O'Regan, and M. Gratzel Nature 353 1991 737