Electrochemical analysis of the adsorption and desorption behaviors of carboxylic acid and anhydride monomers onto zinc surfaces

Electrochimica Acta

Volumn 56, Issue 25, 2011, Pages 9317-9323

  Taheri, P ^a,b   Hauffman, T ^c   Mol, J M C ^b   Flores, J R ^d   Hannour, F ^d   De Wit, J H W ^a,b   Terryn, H ^a,c  

^a MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^d SWINDEN TECHNOLOGY CENTRE   (Netherlands)

Author keywords

Carboxylates; Chronoamperometry; Cyclic voltammetry; Molecular assembly

Indexed keywords

ADSORPTION KINETICS; ADSORPTION MECHANISM; BIFUNCTIONAL; CARBOXYLATES; CARBOXYLIC ACID GROUPS; COORDINATIVE BONDING; DESORPTION BEHAVIOR; DOUBLE-LAYER CAPACITANCE; ELECTROCHEMICAL ANALYSIS; ELECTRON TRANSFER; FTIR; INFRARED REFLECTION ABSORPTION SPECTROSCOPY; INTERFACIAL BONDING; MOLECULAR ASSEMBLY; MONOFUNCTIONAL; MYRISTIC ACID; NEGATIVE POTENTIAL; OXIDE SURFACE; POTENTIAL OF ZERO CHARGE; RING OPENING; SUCCINIC ACIDS; SUCCINIC ANHYDRIDE; SURFACE HYDROXYL;

ADSORPTION; BONDING; CARBOXYLATION; CARBOXYLIC ACIDS; CHRONOAMPEROMETRY; DESORPTION; ELECTROCHEMICAL ELECTRODES; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC;

CYCLIC VOLTAMMETRY;

EID: 80053273962     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.08.009     Document Type: Article

References (39)

1. K. Oberg, P. Persson, A. Shchukarev, and B. Eliasson Thin Solid Films 397 2001 102
2. L. Chen, A. Dudek, Y.L. Lee, and C.H. Chang Langmuir 23 2007 3123
3. J. Plank, and G. Bassioni Z. Naturforsch. 62b 2007 1277
4. N. Kanazawa, K. Urano, N. Kokado, and Y. Urushigawa J. Colloid Interface Sci. 238 2001 196
5. S. Schroldle, F.G. Moore, and G.L. Richmond J. Phys. Chem. C 111 2007 8050
6. A.D. Buckland, C.H. Rochester, and S.A. Topham J. Chem. Soc. Faraday Trans. 1 1980 302
7. M.L. Free, and D. Miller Langmuir 13 1997 4377
8. K. Jackowska, M. Skompska, and E. Przyhska J. Electroanal. Chem. 418 1996 35
9. S. Griveau, J. Pavez, J.H. Zagal, and F. Bedioui J. Electroanal. Chem. 497 2001 75
10. V. Selvaraj, M. Alagar, and I. Hamerton J. Power Sources 160 2006 940
11. P. Jennings, A.C. Jones, A.R. Mount, and A.D. Thomson J. Chem. Soc. Faraday Trans. 93 1997 3791
12. A.S. Camargo, M.J. Aguirre, W. Cheuquepan, Y.Y. Chen, and G.R. Ramirez Electroanalysis 20 2008 2635
13. J. van den Brand, O. Blajiev, P. Beentjes, H. Terryn, and H. de Wit J. Langmuir 20 2004 6308
14. A. Willis, N. Turro, and S. O'Brien Chem. Mater. 17 2005 5970
15. P. Taheri, T. Hauffman, J.M.C. Mol, J.R. Flores, F. Hannour, J.H.W. de Wit, H. Terryn, J. Phys. Chem. C, doi:10.1021/jp204751z.
16. W.H. Mulder, J.J. Calvente, and R. Andreu Langmuir 17 2001 3273
17. J.J. Calvente, Z. Kovocova, M.D. Sanchez, R. Andreu, and W.R. Fawcett Langmuir 12 1996 5696
18. D.F. Yang, and M. Morin J. Electroanal. Chem. 429 1997 1
19. C.E.D. Chidsey Science 251 1991 919
20. C. Miller, P. Cuendet, and M. Gratzel J. Phys. Chem. 95 1991 877
21. H.O. Finklea, and D.D. Hanshew J. Am. Chem. Soc. 114 1992 3173
22. G.K. Rowe, and S.E. Creager J. Phys. Chem. 98 1994 5500
23. C. Avgousti, N. Georgolios, G. Kyriacou, and G. Ritzoulis Electrochim. Acta 44 1999 3295
24. T.L. Barr Thin Solid Films 253 1994 277
25. P. Taheri, J. Wielant, T. Hauffman, J.R. Flores, F. Hannour, J.H.W. de Wit, J.M.C. Mol, and H. Terryn Electrochim. Acta 56 2011 1904
26. P. Thissen, J. Wielant, M. Köyer, S. Toews, and G. Grundmeier Surf. Coat. Technol. 204 2010 3578
27. G. Kataby, M. Cojocaru, R. Prozorov, and A. Gedanken Langmuir 15 1999 1703
28. G. Shustak, A. Domb, and D. Mandler Langmuir 20 2004 7499
29. J. Wielant, T. Hauffman, O. Blajiev, R. Hausbrand, and H. Terryn J. Phys. Chem. 111 2007 13177
30. R.W. Munn Chem. Phys. 236 1998 151
31. H. Ron, and I. Rubinstein J. Am. Chem. Soc. 120 1998 13444
32. A. Ulman, J.E. Eilers, and N. Tillman Langmuir 5 1989 1147
33. W. Paik, S. Eu, K. Lee, S. Chon, and M. Kim Langmuir 16 2000 10198
34. C.M.A. Brett, S. Kresak, T. Hianik, and A.M.O. Brett Electroanalysis 15 2003 557
35. S. Thery, D. Jacquet, and M. Mantel J. Adhes. 56 1996 1
36. L.H. Guo, J.S. Facci, G. McLendon, and R. Mosher Langmuir 10 1994 4588
37. R. Renuka, L. Srinivasan, S. Ramamurthy, A. Veluchamy, and N. Venkatakrishnan J. Appl. Electrochem. 31 2001 655
38. D.K. Gosser Cyclic Voltammetry; Simulation and Analysis of Reaction Mechanisms 1993 VCH New York
39. A.J. Bard, and L.R. Faulkner Electrochemical Methods: Fundamentals and Applications 2nd ed. 1992 Wiley New York