Fabrication of Lead-Free (Na0.5K0.5)NbO 3-BaZrO3-(Bi0.5Li0.5)TiO 3 Ferroelectric Thin Films on (111)Pt/Ti/SiO2/(100)Si Substrate by Pulsed Laser Deposition

Japanese Journal of Applied Physics

Volumn 50, Issue 9 PART 3, 2011, Pages

  Yamazoe, Seiji ^a   Miyoshi, Yuzo ^a   Fukada, Masaki ^a   Komaki, Kazuki ^b   Adachi, Hideaki ^c   Wada, Takahiro ^a  

^a RYUKOKU UNIVERSITY   (Japan)

^b Panasonic Electronic Devices Co Ltd   (Japan)

^c PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITIES; FERROELECTRIC PROPERTY; GRAIN SIZE; HIGH SUBSTRATE TEMPERATURE; LEAD-FREE; P-E HYSTERESIS LOOPS; ROCKING CURVES; SEM IMAGE; SI SUBSTRATES; SPONTANEOUS POLARIZATIONS; TIO;

BARIUM COMPOUNDS; BUFFER LAYERS; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; HYSTERESIS LOOPS; NIOBIUM OXIDE; OPTICAL WAVEGUIDES; PEROVSKITE; POLARIZATION; PULSED LASER DEPOSITION; SODIUM; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

PULSED LASERS;

EID: 80053076298     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.09NA07     Document Type: Article

References (25)

1. I. Kanno, S. Fujii, T. Kameda, and R. Takayama: Appl. Phys. Lett. 70 (1997) 1378.
2. J. F. Shepard, F. Chu, I. Kanno, and S. Trolier-McKinstry: J. Appl. Phys. 85 (1999) 6711.
3. R. E. Jaeger and L. Egerton: J. Am. Ceram. Soc. 45 (1962) 209.
4. Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya, and M. Nakamura: Nature 432 (2004) 84.
5. M. Matsubara, T. Yamaguchi, and W. Sakamoto: J. Am. Ceram. Soc. 88 (2005) 1190.
6. Y. Guo, K. Kakimoto, and H. Ohsato: Appl. Phys. Lett. 85 (2004) 4121.
7. E. Z. Li, H. Kakemoto, and S. Wada: J. Ceram. Soc. Jpn. 115 (2007) 250.
8. T. Saito, H. Adachi, and T. Wada: Jpn. J. Appl. Phys. 44 (2005) L573.
9. C. Pithan, Y. Shiratori, A. Magrez, S. B. Mi, J. Dornseiffer, and R. Waser: J. Ceram. Soc. Jpn. 114 (2006) 995.
10. T. Tani: J. Ceram. Soc. Jpn. 114 (2006) 363.
11. Y. Sun, D. Xiao, L. Wu, D. Lin, J. Zhu, P. Yu, X. Li, Y. Wang, Y. Li, Y. Lin, Y. Zhuang, and Q. Wei: J. Ceram. Soc. Jpn. 116 (2008) 536.
12. S. Tashiro and K. Ishii: J. Ceram. Soc. Jpn. 114 (2006) 386.
13. M. Fukada, S. Yamazoe, and T. Wada: Jpn. J. Appl. Phys. 48 (2009) 091402.
14. T. Takenaka, K. Maruyama, and A. Sakata: Jpn. J. Appl. Phys. 30 (1991) 2236.
15. J. T. Zeng, K. W. Kwok, and H. L. W. Chan: J. Am. Ceram. Soc. 89 (2006) 2828.
16. A. Sasaki, T. Chiba, Y. Mamiya, and E. Otsuki: Jpn. J. Appl. Phys. 38 (1999) 5564.
17. Z. W. Chen, A. Shui, Z. Y. Lu, and P. G. Liu: J. Ceram. Soc. Jpn. 114 (2006) 857.
18. H. Takahashi, Y. Mumanoto, J. Tani, and S. Tsurekawa: Jpn. J. Appl. Phys. 46 (2007) 7044.
19. T. Karaki, K. Yan, T. Miyamoto, and M. Adachi: Jpn. J. Appl. Phys. 46 (2007) L97.
20. T. Karaki, K. Yan, and M. Adachi: Jpn. J. Appl. Phys. 46 (2007) 7035.
21. R. Wang, H. Bando, and M. Itoh: IMF-ISAF 2009 Conf., 2009.
22. S. Yamazoe, Y. Miyoshi, T. Hattori, H. Adachi, and T. Wada: Jpn. J. Appl. Phys. 49 (2010) 09MA06.
23. S. Yamazoe, Y. Miyoshi, K. Komaki, H. Adachi, and T. Wada: Jpn. J. Appl. Phys. 48 (2009) 09KA13.
24. S. Yamazoe, H. Sakurai, M. Fukada, H. Adachi, and T. Wada: Appl. Phys. Lett. 95 (2009) 062906.
25. T. Saito, H. Adachi, T. Wada, and H. Adachi: Jpn. J. Appl. Phys. 44 (2005) 6969.