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Volumn 324, Issue , 2011, Pages 277-281
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High frequency ultrasound, a tool for elastic properties measurement of thin films fabricated on silicon
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Author keywords
High frequency transducers; Ultrasonic characterization; Ultrasound
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Indexed keywords
DIELECTRIC PERMITTIVITIES;
ELASTIC PROPERTIES;
EMBEDDED PARTICLES;
FREQUENCY RANGES;
HIGH FREQUENCY;
HIGH FREQUENCY ACOUSTICS;
HIGH FREQUENCY MEASUREMENTS;
HIGH FREQUENCY TRANSDUCERS;
HIGH FREQUENCY ULTRASOUNDS;
INVERSION METHODS;
LONGITUDINAL WAVES;
MECHANICAL IMPEDANCES;
METALLIC LAYERS;
PARAMETER MEASUREMENT;
SILICON SUBSTRATES;
SPUTTERING TECHNOLOGY;
THIN FILM MATERIAL;
THIN LAYERS;
ULTRASONIC CHARACTERIZATION;
ZNO TRANSDUCERS;
ACOUSTIC IMPEDANCE;
CHARACTERIZATION;
CHEMICALS REMOVAL (WATER TREATMENT);
ELASTICITY;
MEASUREMENTS;
NANOCOMPOSITE FILMS;
PERMITTIVITY;
SEMICONDUCTING SILICON COMPOUNDS;
SHEAR FLOW;
SHEAR WAVES;
SILICON WAFERS;
SINGLE CRYSTALS;
TRANSDUCERS;
ULTRASONIC TRANSDUCERS;
ULTRASONICS;
ZINC OXIDE;
THIN FILMS;
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EID: 80053000094
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/AMR.324.277 Document Type: Conference Paper |
Times cited : (10)
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References (4)
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