Influence of hydrogen and water vapour on the kinetics of chromium oxide growth at high temperature

Oxidation of Metals

Volumn 76, Issue 3-4, 2011, Pages 193-214

  Guillou, S ^a   Cabet, C ^a   Desgranges, C ^a   Marchetti, L ^a   Wouters, Y ^b  

^a DIF   (France)

^b UNIV GRENOBLE ALPES   (France)

Author keywords

Hydrogen; Mechanist model; Oxidation rate; Oxygen equivalent partial pressure; Water vapour

Indexed keywords

CATIONIC DEFECTS; CHROMIUM OXIDES; HELIUM ATMOSPHERE; HIGH TEMPERATURE; LOW WATER; MECHANIST MODEL; OXIDATION BEHAVIOURS; OXIDATION RATE; OXIDATION RATES; OXIDE SCALE; PARABOLIC RATE CONSTANTS; PARTIAL PRESSURE OF OXYGEN; PHOTO-ELECTROCHEMISTRY; SPECIFIC OXIDATION; THEORETICAL RESULT; WATER VAPOUR;

CHROMIUM; DEFECTS; GROWTH (MATERIALS); GROWTH KINETICS; HELIUM; HYDROGEN; OXIDATION; OXYGEN; PARTIAL PRESSURE; RATE CONSTANTS; SCALE (DEPOSITS);

WATER CONTENT;

EID: 80052749799     PISSN: 0030770X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11085-011-9246-6     Document Type: Article

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