Electrochemical investigation of oxide films formed on nickel alloys 182, 600 and 52 in high temperature water

Electrochimica Acta

Volumn 56, Issue 23, 2011, Pages 7871-7879

  De Araújo Figueiredo, Célia ^a   Bosch, Rik Wouter ^b   Vankeerberghen, Marc ^b  

^a CENTRO DE DESENVOLVIMENTO DA TECNOLOGIA NUCLEAR   (Brazil)

^b BELGIAN NUCLEAR RESEARCH CENTRE   (Belgium)

Author keywords

Electrochemical impedance; Mott Schottky; Nickel based alloys; Oxide film; PWR

Indexed keywords

DEFECT CONCENTRATIONS; DISSOLVED HYDROGEN; EFFECT OF HYDROGEN; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL IMPEDANCE; ELECTROCHEMICAL INVESTIGATIONS; ELECTROCHEMICAL TEST; ELECTROCHEMICAL TESTING; EXPOSURE-TIME; HIGH-TEMPERATURE WATER; HIGHER FREQUENCIES; IN-SITU; LOW FREQUENCY; LOWER FREQUENCIES; MOTT-SCHOTTKY; NICKEL BASED ALLOY; OXIDE LAYER; PRIMARY WATER; PWR; ROOM TEMPERATURE; SOLUTION INTERFACE;

ALLOYS; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; HYDROGEN; IRON ALLOYS; NICKEL; NICKEL ALLOYS; NICKEL OXIDE; PRESSURIZED WATER REACTORS; STRESS CORROSION CRACKING;

OXIDE FILMS;

EID: 80052749778     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.05.077     Document Type: Conference Paper

References (18)

1. K. Ahluwalia, EPRI, MRP-213, 2007.
2. S.A. Attanasio, and D.S. Morton Proc. 11th Int. Conf. Environ. Degrad. Mat. Nucl. Systems Stevenson, WA, 10-14 August 2003
3. D.J. Paraventi, and W.C. Moshier T.R. Allen, P.J. King, L. Nelson, Proc. 12th Int. Conf. Environ. Degrad. Mat. Nucl. Power Systems - Water Reactors 2005 TMS
4. H. Sun, X. Wu, and E.H. Han Corros. Sci. 51 2009 2565
5. A.J. Davenport, L.J. Oblonsky, M.P. Ryan, and M.F. Toney J. Electrochem. Soc. 147 2000 2162
6. T. Terachi, N. Totsuka, T. Yamada, T. Nakagawa, H. Deguchi, M. Horiuchi, and M. Oshitami J. Nucl. Sci. Technol. 40 2003 509
7. T. Nakagawa, N. Totsuka, T. Terachi, and N. Nakajima J. Nucl. Sci. Technol. 40 2003 39
8. R.W. Bosch, and M. Vankeerberghen Electrochim. Acta 52 2007 7538
9. L. Marchetti, S. Perrin, O. Raquet, F. Miserque, M. Pijolat, F. Valdivieso, and Y. Wouters Proc Int. Symp. Fontevraud, France, 18-22 September 2006
10. M.V. Cardoso, S.T. Amaral, and E.M.A. Martini Corros. Sci. 50 2008 2429
11. Z. Feng, X. Cheng, C. Dong, L. Xu, and X. Li Corros. Sci. 52 2010 3646
12. M.C. Belo, M. Walls, N.E. Hakiki, J. Corset, E. Picquenard, G. Sagon, and D. Noël Corros. Sci. 40 1998 447
13. L.A.S. Ries, M.C. Belo, M.G.S. Ferreira, and I.L. Muller Corros. Sci. 50 2008 676
14. T. Dan, T. Shoji, Z. Lu, K. Sakaguchi, J. Wang, E.H. Han, and W. Ke Corros. Sci. 52 2010 1228
15. M.F. Montemor, A.M.P. Simões, M.G.S. Ferreira, and M.C. Belo Corros. Sci. 41 1999 17
16. L.V. Taveira, D.A.D. Corte, and L.F.P. Dick Proc. 216th ECS Meeting Vienna, Austria, 4-9 October 2009
17. A.C. Maria, T.M. Benedetti, R.M. Torresi, and L.F.P. Dick Proc. 216th ECS Meeting Vienna, Austria, 4-9 October 2009
18. J. Huang, X. Wu, and E.H. Han Corros. Sci. 51 2009 2976