-
3
-
-
0004094988
-
-
E. M. van Veldhuizen, Ed., Nova Science Publishers, Inc. Huntington, NY.
-
E. M. van Veldhuizen, Ed., Electrical Discharges for Environmental Purposes: Fundamentals and Applications, Nova Science Publishers, Inc., Huntington, NY 2000.
-
(2000)
Electrical Discharges for Environmental Purposes: Fundamentals and Applications
-
-
-
4
-
-
0000132110
-
-
K. L. L. Vercammen, A. A. Berezin, F. Lox, J.-S. Chang, J. Adv. Oxid. Technol. 1997, 2, 312.
-
(1997)
J. Adv. Oxid. Technol.
, vol.2
, pp. 312
-
-
Vercammen, K.L.L.1
Berezin, A.A.2
Lox, F.3
Chang, J.-S.4
-
7
-
-
0000282421
-
Treatment of organic pollutants by corona discharge plasma
-
in, NATO Science Series, 2: Environmental Security, I. I. Inculet, F. T. Tanasescu, R. Cramariuc, Eds., Kluwer Academic Publishers, Dordrecht, The Netherlands, 63, p.
-
E. Odic, C. Paradisi, M. Rea, L. Parissi, A. Goldman, M. Goldman, " Treatment of organic pollutants by corona discharge plasma ", in The Modern Problems of Electrostatics with Applications in Environment Protection, NATO Science Series, 2: Environmental Security, I. I. Inculet, F. T. Tanasescu, R. Cramariuc, Eds., Kluwer Academic Publishers, Dordrecht, The Netherlands 1999, Vol. 63, p. 143.
-
(1999)
The Modern Problems of Electrostatics with Applications in Environment Protection
, pp. 143
-
-
Odic, E.1
Paradisi, C.2
Rea, M.3
Parissi, L.4
Goldman, A.5
Goldman, M.6
-
8
-
-
32644439989
-
-
B. R. Locke, M. Sato, P. Sunka, M. R. Hoffmann, J.-S. Chang, Ind. Eng. Chem. Res. 2006, 45, 882.
-
(2006)
Ind. Eng. Chem. Res.
, vol.45
, pp. 882
-
-
Locke, B.R.1
Sato, M.2
Sunka, P.3
Hoffmann, M.R.4
Chang, J.-S.5
-
9
-
-
0001420068
-
-
A. K. Sharma, D. M. Camaioni, G. B. Josephson, S. C. Goheen, G. M. Mong, J. Adv. Oxid. Technol. 1997, 2, 239.
-
(1997)
J. Adv. Oxid. Technol.
, vol.2
, pp. 239
-
-
Sharma, A.K.1
Camaioni, D.M.2
Josephson, G.B.3
Goheen, S.C.4
Mong, G.M.5
-
11
-
-
0343963097
-
-
W. F. L. M. Hoeben, E. M. van Veldhuizen, W. R. Rutgers, G. M. W. Kroesen, J. Phys. D: Appl. Phys. 1999, 32, L133.
-
(1999)
J. Phys. D: Appl. Phys.
, vol.32
-
-
Hoeben, W.F.L.M.1
Van Veldhuizen, E.M.2
Rutgers, W.R.3
Kroesen, G.M.W.4
-
12
-
-
0034247893
-
-
W. F. L. M. Hoeben, E. M. van Veldhuizen, W. R. Rutgers, C. A. M. G. Cramers, G. M. W. Kroesen, Plasma Sources Sci. Technol. 2000, 9, 361.
-
(2000)
Plasma Sources Sci. Technol.
, vol.9
, pp. 361
-
-
Hoeben, W.F.L.M.1
Van Veldhuizen, E.M.2
Rutgers, W.R.3
Cramers, C.A.M.G.4
Kroesen, G.M.W.5
-
13
-
-
0037184351
-
-
N. Sano, T. Kawashima, J. Fujikawa, T. Fujimoto, T. Kitai, T. Kanki, A. Toyoda, Ind. Eng. Chem. Res. 2002, 41, 5906.
-
(2002)
Ind. Eng. Chem. Res.
, vol.41
, pp. 5906
-
-
Sano, N.1
Kawashima, T.2
Fujikawa, J.3
Fujimoto, T.4
Kitai, T.5
Kanki, T.6
Toyoda, A.7
-
14
-
-
2442686884
-
-
N. Sano, T. Fujimoto, T. Kawashima, D. Yamamoto, T. Kanki, A. Toyoda, Sep. Purif. Technol. 2004, 37, 169.
-
(2004)
Sep. Purif. Technol.
, vol.37
, pp. 169
-
-
Sano, N.1
Fujimoto, T.2
Kawashima, T.3
Yamamoto, D.4
Kanki, T.5
Toyoda, A.6
-
15
-
-
22544444957
-
-
L. R. Grabowski, E. M. van Veldhuizen, W. R. Rutgers, J. Adv. Oxid. Technol. 2005, 8, 142.
-
(2005)
J. Adv. Oxid. Technol.
, vol.8
, pp. 142
-
-
Grabowski, L.R.1
Van Veldhuizen, E.M.2
Rutgers, W.R.3
-
16
-
-
31144460287
-
-
L. R. Grabowski, E. M. van Veldhuizen, A. J. M. Pemen, W. R. Rutgers, Plasma Chem. Plasma Process. 2006, 26, 3.
-
(2006)
Plasma Chem. Plasma Process.
, vol.26
, pp. 3
-
-
Grabowski, L.R.1
Van Veldhuizen, E.M.2
Pemen, A.J.M.3
Rutgers, W.R.4
-
17
-
-
53349151659
-
-
M. Sato, T. Tokutake, T. Ohshima, A. T. Sugiarto, Ind. Appl. 2008, 44, 1397.
-
(2008)
Ind. Appl.
, vol.44
, pp. 1397
-
-
Sato, M.1
Tokutake, T.2
Ohshima, T.3
Sugiarto, A.T.4
-
18
-
-
61849181517
-
-
H. Krause, B. Schweiger, J. Schuhmacher, S. Scholl, U. Steinfeld, Chemosphere 2009, 75, 163.
-
(2009)
Chemosphere
, vol.75
, pp. 163
-
-
Krause, H.1
Schweiger, B.2
Schuhmacher, J.3
Scholl, S.4
Steinfeld, U.5
-
19
-
-
68349102960
-
-
T. H. Dang, A. Denat, O. Lesaint, G. Teissedre, Eur. Phys. J. Appl. Phys. 2009, 47, 22818.
-
(2009)
Eur. Phys. J. Appl. Phys.
, vol.47
, pp. 22818
-
-
Dang, T.H.1
Denat, A.2
Lesaint, O.3
Teissedre, G.4
-
20
-
-
33845554162
-
-
L. Forni, D. Bahnemann, E. J. Hart, J. Phys. Chem. 1982, 86, 255.
-
(1982)
J. Phys. Chem.
, vol.86
, pp. 255
-
-
Forni, L.1
Bahnemann, D.2
Hart, E.J.3
-
23
-
-
0027180889
-
-
A. K. Sharma, B. R. Locke, P. Arce, W. C. Finney, Hazard. Waste Hazard. Mater. 1993, 10, 209.
-
(1993)
Hazard. Waste Hazard. Mater.
, vol.10
, pp. 209
-
-
Sharma, A.K.1
Locke, B.R.2
Arce, P.3
Finney, W.C.4
-
24
-
-
0029735120
-
-
M. Sato, T. Ohgiyama, J. S. Clements, IEEE Trans. Ind. Appl. 1996, 32, 106.
-
(1996)
IEEE Trans. Ind. Appl.
, vol.32
, pp. 106
-
-
Sato, M.1
Ohgiyama, T.2
Clements, J.S.3
-
25
-
-
0032532489
-
-
P. S. Lang, W. K. Ching, D. M. Willberg, M. R. Hoffmann, Environ. Sci. Technol. 1998, 32, 3142.
-
(1998)
Environ. Sci. Technol.
, vol.32
, pp. 3142
-
-
Lang, P.S.1
Ching, W.K.2
Willberg, D.M.3
Hoffmann, M.R.4
-
26
-
-
0032672754
-
-
P. Sunka, V. Babicky, M. Clupek, P. Lukes, M. Simek, J. Schmidt, M. Cernak, Plasma Sources Sci. Technol. 1999, 8, 258.
-
(1999)
Plasma Sources Sci. Technol.
, vol.8
, pp. 258
-
-
Sunka, P.1
Babicky, V.2
Clupek, M.3
Lukes, P.4
Simek, M.5
Schmidt, J.6
Cernak, M.7
-
27
-
-
0032669446
-
-
B. Sun, M. Sato, J. S. Clements, J. Phys. D: Appl. Phys. 1999, 32, 1908.
-
(1999)
J. Phys. D: Appl. Phys.
, vol.32
, pp. 1908
-
-
Sun, B.1
Sato, M.2
Clements, J.S.3
-
28
-
-
0034141178
-
-
B. Sun, M. Sato, J. S. Clements, Environ. Sci. Technol. 2000, 34, 509.
-
(2000)
Environ. Sci. Technol.
, vol.34
, pp. 509
-
-
Sun, B.1
Sato, M.2
Clements, J.S.3
-
29
-
-
0035250512
-
-
M. A. Malik, A. Ghaffar, S. A. Malik, Plasma Sources Sci. Technol. 2001, 10, 82.
-
(2001)
Plasma Sources Sci. Technol.
, vol.10
, pp. 82
-
-
Malik, M.A.1
Ghaffar, A.2
Malik, S.A.3
-
30
-
-
22544469895
-
-
P. Sunka, V. Babicky, M. Clupek, M. Fuciman, P. Lukes, M. Simek, J. Benes, B. Locke, Z. Majcherova, Acta Phys. Slovaka 2004, 54, 135.
-
(2004)
Acta Phys. Slovaka
, vol.54
, pp. 135
-
-
Sunka, P.1
Babicky, V.2
Clupek, M.3
Fuciman, M.4
Lukes, P.5
Simek, M.6
Benes, J.7
Locke, B.8
Majcherova, Z.9
-
31
-
-
1842477378
-
-
P. Lukes, A. T. Appleton, B. R. Locke, IEEE Trans. Ind. Appl. 2004, 40, 60.
-
(2004)
IEEE Trans. Ind. Appl.
, vol.40
, pp. 60
-
-
Lukes, P.1
Appleton, A.T.2
Locke, B.R.3
-
33
-
-
77956156297
-
-
M. Dors, E. Metel, J. Mizeraczyk, Int. J. Plasma Environ. Sci. Technol. 2007, 1, 76.
-
(2007)
Int. J. Plasma Environ. Sci. Technol.
, vol.1
, pp. 76
-
-
Dors, M.1
Metel, E.2
Mizeraczyk, J.3
-
35
-
-
43049096078
-
-
P. Baroch, V. Anita, N. Saito, O. Takai, J. Electrostat. 2008, 66, 294.
-
(2008)
J. Electrostat.
, vol.66
, pp. 294
-
-
Baroch, P.1
Anita, V.2
Saito, N.3
Takai, O.4
-
36
-
-
0036463526
-
-
S. Esplugas, J. Gimenez, S. Contreras, E. Pascual, M. Rodriguez, Water Res. 2002, 36, 1034.
-
(2002)
Water Res.
, vol.36
, pp. 1034
-
-
Esplugas, S.1
Gimenez, J.2
Contreras, S.3
Pascual, E.4
Rodriguez, M.5
-
38
-
-
28444459841
-
-
J. A. Zazo, J. A. Casas, A. F. Mohedano, M. A. Gilarranz, J. J. Rodriguez, Environ. Sci. Technol. 2005, 39, 9295.
-
(2005)
Environ. Sci. Technol.
, vol.39
, pp. 9295
-
-
Zazo, J.A.1
Casas, J.A.2
Mohedano, A.F.3
Gilarranz, M.A.4
Rodriguez, J.J.5
-
43
-
-
0032180072
-
-
R. Gasparik, C. Yamabe, S. Ihara, S. Satoh, Jpn. J. Appl. Phys. 1998, 37, 5786.
-
(1998)
Jpn. J. Appl. Phys.
, vol.37
, pp. 5786
-
-
Gasparik, R.1
Yamabe, C.2
Ihara, S.3
Satoh, S.4
-
44
-
-
0001031210
-
-
Y. Yamamoto, E. Niki, H. Shiokawa, Y. Kamiya, J. Org. Chem. 1979, 44, 2137.
-
(1979)
J. Org. Chem.
, vol.44
, pp. 2137
-
-
Yamamoto, Y.1
Niki, E.2
Shiokawa, H.3
Kamiya, Y.4
-
45
-
-
84918833988
-
-
G. V. Buxton, C. L. Greenstock, W. P. Helman, A. B. Ross, J. Phys. Chem. Ref. Data 1988, 17, 513.
-
(1988)
J. Phys. Chem. Ref. Data
, vol.17
, pp. 513
-
-
Buxton, G.V.1
Greenstock, C.L.2
Helman, W.P.3
Ross, A.B.4
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