Impact of mixture gas plasma of N2 and O2 as the N source on ZnO-based ultraviolet light-emitting diodes fabricated by molecular beam epitaxy

Applied Physics Express

Volumn 4, Issue 9, 2011, Pages

  Kato, Hiroyuki ^a   Yamamuro, Tomofumi ^a   Ogawa, Akio ^a   Kyotani, Chizu ^a   Sano, Michihiro ^a  

^a STANLEY ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOUBLE HETEROSTRUCTURES; ELECTROLUMINESCENCE INTENSITY; MIXTURE GAS; OPTICAL EMISSION SPECTROMETRY; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY; ULTRAVIOLET LIGHT-EMITTING DIODES; ZNO SUBSTRATE;

EPITAXIAL GROWTH; FABRICATION; GASES; LIGHT EMISSION; MIXTURES; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; OPTICAL EMISSION SPECTROSCOPY; PLASMAS; ULTRAVIOLET RADIATION; ZINC OXIDE;

LIGHT EMITTING DIODES;

EID: 80052569507     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.4.091105     Document Type: Article

References (12)

1. D. M. Bagnall et al.: Appl. Phys. Lett. 70 (1997) 2230.
2. Z. K. Tang et al.: Appl. Phys. Lett. 72 (1998) 3270.
3. D. M. Bagnall et al.: Appl. Phys. Lett. 73 (1998) 1038.
4. A. Tsukazaki et al.: Nat. Mater. 4 (2005) 42.
5. A. Tsukazaki et al.: Jpn. J. Appl. Phys. 44 (2005) L643.
6. K. Nakahara et al.: Appl. Phys. Lett. 97 (2010) 013501.
7. H. Kato et al.: J. Cryst. Growth 265 (2004) 375.
8. H. Kato et al.: Jpn. J. Appl. Phys. 42 (2003) 2241.
9. E.-C. Lee et al.: Phys. Rev. B 64 (2001) 085120.
10. S. Limpijumnong et al.: Appl. Phys. Lett. 86 (2005) 211910.
11. K. Maeda et al.: Semicond. Sci. Technol. 20 (2005) S49.
12. Z. P. Wei et al.: Appl. Phys. Lett. 90 (2007) 042113.