PH-sensitive nanostructured architectures based on synthetic and/or natural weak polyelectrolytes

Colloid and Polymer Science

Volumn 289, Issue 12, 2011, Pages 1387-1396

  Mihai, Marcela ^a   Stoica, Iuliana ^a   Schwarz, Simona ^b  

^a PETRU PONI INSTITUTE OF MACROMOLECULAR CHEMISTRY   (Romania)

^b LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

Author keywords

Chitosan; pH sensitive polymers; Polyelectrolyte multilayer; Surface modification; Swelling degree

Indexed keywords

CHAIN STRUCTURE; DOUBLE LAYERS; LAYER BY LAYER SELF ASSEMBLY; NANO-STRUCTURED; PH SENSITIVE; PLANAR SURFACE; POLY(ACRYLIC ACID ); POLY(ALLYLAMINE HYDROCHLORIDE); POLYANIONS; POLYCATIONS; POLYELECTROLYTE MULTILAYER; POLYIONS; SWELLING DEGREE; WEAK POLYELECTROLYTES;

ACRYLICS; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBOXYLIC ACIDS; CHITOSAN; FILM PREPARATION; INFRARED SPECTROSCOPY; MULTILAYERS; SURFACE TREATMENT;

POLYELECTROLYTES;

ACRYLIC ACID DERIVATIVE; ALLYLAMINE DERIVATIVE; CHITOSAN; COPOLYMER; POLY(2 ACRYLAMIDO 2 METHYLPROPANESULFONIC ACID CO ACRYLIC ACID); POLY(ALLYLAMINE HYDROCHLORIDE); POLYACRYLIC ACID; POLYANION; POLYELECTROLYTE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; COMPOSITE MATERIAL; CONTROLLED STUDY; FILM; GRAVIMETRY; INFRARED SPECTROSCOPY; PH; POTENTIOMETRIC TITRATION; PRIORITY JOURNAL; PROTON NUCLEAR MAGNETIC RESONANCE; SENSITIVITY ANALYSIS; VISCOMETRY;

EID: 80052487293     PISSN: 0303402X     EISSN: 14351536     Source Type: Journal    
DOI: 10.1007/s00396-011-2462-4     Document Type: Article

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