Masking photochromic films for nanolithography technology

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 9, 2011, Pages 2866-2869

  Ayt, Anton ^a   Barachevsky, Valery ^a   Kobeleva, Olga ^a   Valova, Tatyana ^a   Gorelik, Alexander ^a   Krayushkin, Michail ^b   Komlenok, Maksim ^c   Kononenko, Vitaly ^c  

^a PHOTOCHEMISTRY CENTER   (Russian Federation)

^b RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^c PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

Author keywords

Nanolithography; Photochromic films

Indexed keywords

193 NM LASER; BEST VALUE; CONCENTRATION RATIO; EXPOSURE DOSE; OPERATING CONDITION; OPTIMAL MASS RATIO; ORGANIC SYSTEMS; PHOTOCHEMICAL TRANSFORMATIONS; PHOTOCHROMIC COMPOUND; PHOTOCHROMIC DIARYLETHENES; PHOTOCHROMIC FILMS; PHOTOCHROMIC LAYERS; PHOTOCHROMIC POLYMERS; PHOTORESIST LAYERS; POLYMER BINDERS; PREPARATION TECHNOLOGY; SOLID FILMS;

FILM PREPARATION; NANOLITHOGRAPHY; OLEFINS; PHOTOCHROMISM; PHOTOPOLYMERS; PHOTORESISTS; PLASTIC FILMS;

POLYMER FILMS;

EID: 80052339877     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201084073     Document Type: Article

References (3)

1. V. A. Barachevsky, G. I. Lashkov, V. A. Tsekhomsky, Photochromism and Its Application (Khimiya, Moscow (in Russian), 1977), p. 279 .
2. A. M. Biswas, J. Li, J. A. Hiserote, and L. S. Melvin III, Proc. SPIE 6349, 63491 (2006).
3. R. Menon and H. I. Smith, J. Opt. Soc. Am. A 23, 2290 (2006).