Gold membranes with large arrays of sub-m holes fabricated by wafer-scale Nanosphere Lithography

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Volumn , Issue , 2011, Pages 610-613

  Klein, M J K ^a,b   Eckert, R ^a   Guillaumee, M ^a   Dunbar, L A ^a   Heinzelmann, H ^a   Brugger, J ^b   Pugin, R ^a  

^a CSEM   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

extraordinary optical transmission; gold membranes; hole arrays; Nanosphere Lithography; sub wavelength holes; surface plasmons

Indexed keywords

EXTRAORDINARY OPTICAL TRANSMISSION; HOLE ARRAYS; NANOSPHERE LITHOGRAPHY; SUB-WAVELENGTH HOLES; SURFACE PLASMONS;

ACTUATORS; ASPECT RATIO; ETCHING; FABRICATION; GOLD; GOLD DEPOSITS; LIGHT TRANSMISSION; LITHOGRAPHY; MICROSYSTEMS; MONOLAYERS; NANOSPHERES; PLASMONS; SILICON WAFERS; SOLID-STATE SENSORS;

MEMBRANES;

EID: 80052124106     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/TRANSDUCERS.2011.5969777     Document Type: Conference Paper

References (11)

1. W. L. Barnes, A. Dereux, T. W. Ebbesen, "Surface plasmon subwavelength optics", Nature, vol. 424, pp. 824-830, 2003.
2. H. Raether, "Surface Plasmons", Springer-Berlin, 1988.
3. D. Sinton, R. Gordon, A. G. Brolo, "Nanohole arrays in metal films as optofluidic elements: Progress and potential", Microfluid Nanofluid, vol. 4, pp. 107-116, 2008.
4. J. Dintinger, S. Klein, T. W. Ebbesen, "Molecule-Surface Plasmon Interactions in Hole Arrays: Enhanced Absorption, Refractive Index Changes, and All-Optical Switching", Adv. Mater. , vol. 18, pp. 1267-1270, 2006.
5. A. Degiron, H. J. Lezec, W. L. Barnes, T. W. Ebbesen. "Effects of hole depth on enhanced light transmission through subwavelength hole arrays", Appl. Phys. Lett. , vol. 81, pp. 4327-4329, 2002.
6. K. L. van der Molen, K. J. Klein Koerkamp, S. Enoch, F. B. Segerink, N. F. van Hulst, and L. Kuipers, "Role of shape and localized resonances in extraordinary transmission through periodic arrays of subwavelength holes: Experiment and theory", Phys. Rev. B, vol. 72, 045421, 2005.
7. J. Henzie, J. Lee, H. M. Lee, W. Hasan, T. W. Odom, "Nanofabrication of Plasmonic Structures", Annu. Rev. Phys. Chem. , vol. 60, pp. 147-165, 2008.
8. J. C. Hulteen, R. P. Van Duyne, "Nanosphere lithography-a materials general fabrication process for periodic particle array surfaces", J. Vac. Sci. Technol. A, vol. 13, pp. 1553-1558, 1995.
9. 2 at 100 sccm, 100 W incident RF power resulting in a self-bias voltage of -260 V.
10. C. Haginoya, M. Ishibashi, K. Koike, "Nanostructure array fabrication with a size-controllable natural lithograph", Apl. Phys. Lett. , vol. 71, pp. 2934-2936, 1997.
11. M. J. K. Klein, "Wafer-scale fabrication of thin SiN membranes and Au films and membranes with arrays of sub-μm holes using nanosphere lithography", Ph. D. thesis EPFL No. 4883, 2010.