Formation of anatase and TiO from Ti thin film after anodic treatment and thermal annealing

Journal of the Electrochemical Society

Volumn 158, Issue 10, 2011, Pages

  Chung, Yu Lin ^a   Gan, Der Shin ^a   Ou, Keng Liang ^b   Chiou, Shi Yung ^c  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b TAIPEI MEDICAL UNIVERSITY   (Taiwan)

^c NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TIO; ANODIC TREATMENT; PHASE TRANSFORMATION; THERMAL-ANNEALING; TI FILM; TI THIN FILMS; TIO; TRANSMISSION ELECTRON;

ANNEALING; NANOCRYSTALLITES; OXIDE MINERALS; PHOTOELECTRON SPECTROSCOPY; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 80052087077     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3615999     Document Type: Article

References (26)

1. S. L. Carlson, T. R. Rostlunt, B. Abrektsson, and P. I. Brnemark, Acta Orthop. Scand., 57, 285 (1986). 10.3109/17453678608994393
2. B. Kasemo, J. Prosthet. Dent., 49, 832 (1983). 10.1016/0022-3913(83) 90359-1
3. R. J. Solar, S. R. Pollack, and E. Korostoff, J. Biomed. Mater. Res., 13, 217 (1979). 10.1002/jbm.v13:2
4. G. J. Exarhos, J. Vac. Sci. Technol. A, 4, 2962 (1986). 10.1116/1.573609
5. P. Lbl, M. Huppertz, and D. Mergel, Thin Solid Films, 251, 72 (1994). 10.1016/0040-6090(94)90843-5
6. N. Martin, C. Rousselot, D. Rondot, F. Palmino, and R. Mercier, Thin Solid Films, 300, 113 (1997). 10.1016/S0040-6090(96)09510-7
7. J. He, W. Zhou, X. Zhou, X. Zhong, X. Zhang, P. Wan, B. Zhu, and W. Chen, J. Mater. Sci. Mater. Med., 19, 3465 (2008). 10.1007/s10856-008-3505-3
8. M. Uchida, H. M. Kim, T. Kokubo, S. Fujibayashi, and T. Nakamura, J. Biomed. Mater. Res., 64A, 164 (2003). 10.1002/jbm.a.v64a:1
9. C. C. Ting, S. Y. Chen, and D. M. Liu, J. Appl. Phys., 88, 4628 (2000). 10.1063/1.1309039
10. C. H. Kao, S. W. Yeh, H. L. Huang, D. Gan, and P. Shen, J. Phys. Chem. C., 115, 5648 (2011). 10.1021/jp109082g
11. T. Ohtsuka, J. Guo, and N. Sato, J. Electrochem. Soc., 133, 2473 (1986). 10.1149/1.2108452
12. L. D. Arsov, C. Kormann, and W. Plieth, J. Electrochem. Soc., 138, 2964 (1991). 10.1149/1.2085349
13. H. Habazaki, M. Uozumi, H. Konno, K. Shimizu, P. Skeldon, and G. E. Thompson, Corros. Sci., 45, 2063 (2003). 10.1016/S0010-938X(03)00040-4 (Pubitemid 36715507)
14. T. Shibata and Y. C. Zhu, Corros. Sci., 37, 253 (1995). 10.1016/0010-938X(94)00133-Q
15. M. V. Diamanti and M. P. Pedeferri, Corros. Sci., 49, 939 (2007). 10.1016/j.corsci.2006.04.002 (Pubitemid 44821129)
16. D. Velten, V. Biehl, F. Aubertin, B. Valeske, W. Possart, and J. Breme, J. Biomed. Mater. Res., 59, 18 (2002). 10.1002/jbm.v59:1
17. G. K. Mor, O. K. Varghese, M. Paulose, and C. A. Grimes, Adv. Funct. Mater., 15, 1291 (2005). 10.1002/adfm.v15:8
18. I. Roman, C. Fratila, E. Vasile, A. Petre, and M. L. Soare, Mater. Sci. Eng., B, 165, 207 (2009). 10.1016/j.mseb.2009.07.012
19. X. Meng, T. Y. Lee, H. Chen, D. W. Shin, K. W. Kwon, S. J. Kwon, and J. B. Yoo, J. Nanosci. Nanotechnol., 10, 4259 (2010). 10.1166/jnn.2010.2209
20. N. Masahashi, Y. Mizukoshi, S. Semboshi, and N. Ohtsu, Appl. Catal., B, 90, 255 (2009). 10.1016/j.apcatb.2009.03.011
21. N. Masahashi, S. Semboshi, N. Ohtsu, and M. Oku, Thin Solid Films, 516, 7488 (2008). 10.1016/j.tsf.2008.03.047
22. Y. B. Xie and X. Z. Li, Mater. Chem. Phys., 95, 39 (2006). 10.1016/j.matchemphys.2005.05.048 (Pubitemid 41426918)
23. R. Narayanan and S. K. Seshadri, J. Appl. Electrochem., 36, 475 (2006). 10.1007/s10800-005-9099-2 (Pubitemid 43201055)
24. H. C. Cheng, S. Y. Lee, C. C. Chen, Y. C. Shyng, and K. L. Ou, J. Electrochem. Soc., 154, E13 (2007). 10.1149/1.2386947 (Pubitemid 44866332)
25. M. Jobim, M. Taborelli, and P. Descouts, J. Appl. Phys., 77, 5149 (1995). 10.1063/1.359259
26. D. A. H. Hannor and C. C. Sorrell, J. Mater. Sci., 46, 855 (2011). 10.1007/s10853-010-5113-0