Surface refinement and electronic properties of graphene layers grown on copper substrate: An XPS, UPS and EELS study

Applied Surface Science

Volumn 257, Issue 23, 2011, Pages 9785-9790

  Siokou, A ^a   Ravani, F ^a   Karakalos, S ^a   Frank, O ^a,c   Kalbac, M ^c   Galiotis, C ^a,b  

^a INSTITUTE OF CHEMICAL ENGINEERING SCIENCES   (Greece)

^b UNIVERSITY OF PATRAS   (Greece)

^c J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

Author keywords

Cleaning treatment; Copper substrate; EELS; Graphene; UHV; UPS; XPS

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; ENERGY DISSIPATION; INTERFACES (MATERIALS); PHOTOELECTRONS; PHOTONS; SUBSTRATES; SURFACE TREATMENT; ULTRAHIGH VACUUM; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CLEANING TREATMENT; COPPER SUBSTRATES; ELECTRONIC PROPERTIES OF GRAPHENE; GRAPHENE LAYERS; GRAPHITIC CARBONS; POLYCRYSTALLINE; SURFACE REFINEMENT; WORK FUNCTION MEASUREMENTS;

GRAPHENE;

EID: 80051796083     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.06.017     Document Type: Article

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