Wafer-scale fabrication of ordered binary colloidal monolayers with adjustable stoichiometries

Advanced Functional Materials

Volumn 21, Issue 16, 2011, Pages 3064-3073

  Vogel, Nicolas ^a   De Viguerie, Laurence ^b   Jonas, Ulrich ^b   Weiss, Clemens K ^a   Landfester, Katharina ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

Author keywords

colloid lithography; colloids; monolayers; self assembly; surface patterning

Indexed keywords

2-D CRYSTALS; AIR WATER INTERFACES; ARBITRARY TOPOGRAPHY; BINARY COLLOIDAL MONOLAYERS; BINARY CRYSTALS; BUTYL CYANOACRYLATE; CLOSE-PACKED LAYERS; CLOSE-PACKED MONOLAYERS; COLLOIDAL MONOLAYERS; COMPLEX PATTERN; CRYSTALLIZATION PROCESS; DEGREE OF CONTROL; HEXAGONAL PACKING; HIGH ORDER; INTERFACIAL POLYMERIZATION; INTERSTITIAL SITES; LANGMUIR TROUGH; LARGE SPHERES; LITHOGRAPHIC PROCESS; PARTICLE SIZE RATIO; PH VALUE; SINGLE-STEP; SMALL PARTICLES; SOLID SUBSTRATES; SUBPHASES; SURFACE LOWERING; SURFACE NANOSTRUCTURE; SURFACE PATTERNING; TEMPLATING; TWO PARTICLES; WAFER SCALE FABRICATION;

COLLOID CHEMISTRY; COLLOIDS; CONTACT ANGLE; CRYSTALS; PHASE INTERFACES; PROCESS CONTROL; STOICHIOMETRY; TWO DIMENSIONAL;

MONOLAYERS;

EID: 80051714839     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201100414     Document Type: Article

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