Laterally patterned ultraflat surfaces

Small

Volumn 5, Issue 7, 2009, Pages 821-825

  Vogel, Nicolas ^a   Jung, Mathieu ^a   Retsch, Markus ^a   Knoll, Wolfgang ^a   Jonas, Ulrich ^a,b   Köper, Ingo ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

Author keywords

Electrodes; Lithography; Patterning; Self assembled monolayers; Surfaces

Indexed keywords

ATOMIC LAYERS; FUNCTIONAL MOIETIES; GOLD STRUCTURES; LENGTH-SCALE; LINESCAN; MATRIXES; PATTERNING; SHEET-LIKE STRUCTURES; SILICON DIOXIDES; SMOOTH TRANSITIONS; STRUCTURED SUBSTRATES; TEMPLATE MATERIALS; TOPOGRAPHIC FEATURES; ULTRAFLAT;

AMINES; ELECTRODES; MICA; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICA; SILICATE MINERALS; SILICON WAFERS; SURFACE DEFECTS; SURFACE ROUGHNESS; SURFACES;

SELF ASSEMBLED MONOLAYERS;

BIOMATERIAL; GOLD; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; GENETIC PROCEDURES; SURFACE PROPERTY;

BIOCOMPATIBLE MATERIALS; BIOSENSING TECHNIQUES; GOLD; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 65449125455     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200801583     Document Type: Article

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