Meso-scale oriented simulation towards virtual process engineering (VPE)-The EMMS Paradigm

Chemical Engineering Science

Volumn 66, Issue 19, 2011, Pages 4426-4458

  Ge, Wei ^a   Wang, Wei ^a   Yang, Ning ^a   Li, Jinghai ^a   Kwauk, Mooson ^a   Chen, Feiguo ^a   Chen, Jianhua ^a   Fang, Xiaojian ^a   Guo, Li ^a   He, Xianfeng ^a   Liu, Xinhua ^a   Liu, Yaning ^a   Lu, Bona ^a   Wang, Jian ^a   Wang, Junwu ^a   Wang, Limin ^a   Wang, Xiaowei ^a   Xiong, Qingang ^a   Xu, Ming ^a   Deng, Lijuan ^a   Han, Yongsheng ^a   Hou, Chaofeng ^a   Hua, Leina ^a   Huang, Wenlai ^a   Li, Bo ^a   Li, Chengxiang ^a   Li, Fei ^a   Ren, Ying ^a   Xu, Ji ^a   Zhang, Nan ^a   Zhang, Yun ^a   Zhou, Guofeng ^a   Zhou, Guangzheng ^a   more..

^a INSTITUTE OF PROCESS ENGINEERING   (China)

Author keywords

Complex system; GPU computing; Meso scale; Multi phase flow; Multi scale; Virtual process engineering

Indexed keywords

ACCURATE MODELING; CATALYTIC PARTICLES; CHINESE ACADEMY OF SCIENCES; COMMON FEATURES; COMPUTATIONAL SCIENCE; COMPUTING HARDWARE; COMPUTING PARADIGM; DISCRETE ELEMENTS; DOMINANT MECHANISM; ENABLING TECHNOLOGIES; ENERGY MINIMIZATION; ENGINEERING PRACTICES; EVOLUTION SPEED; FLOW PARAMETERS; GAS LIQUID FLOWS; GAS-SOLID FLOWS; GAS-SOLID FLUIDIZATION; GENERALIZED MODELS; GLOBAL BEHAVIORS; GLOBAL DISTRIBUTION; GPU COMPUTING; GRAPHIC PROCESSING UNITS; INDUSTRIAL PROCESSS; INSTITUTE OF PROCESS ENGINEERINGS; LEVELS OF DETAIL; MAXIMIZING ISO-PARAFFINS; MESOSCALE; MULTI OBJECTIVE; MULTISCALES; NETWORK-BASED COMPUTING; NUMERICAL SOFTWARE; ON-LINE MEASUREMENT; PETAFLOPS; PHYSICAL MODEL; PHYSICAL MODELING; POST PROCESSING; PSEUDO-PARTICLE MODELING; REAL TIME COMPUTING; RESEARCH AND DEVELOPMENT; SCIENTIFIC RESEARCHES; SEAMLESS INTEGRATION; SIMULATED SYSTEM; SIMULATION METHODS; STABILITY CONDITION; VIRTUAL LABORATORIES; VIRTUAL PROCESS;

CHEMICAL ENGINEERING; COMPUTER HARDWARE; FLUIDIZATION; INDUSTRIAL APPLICATIONS; INDUSTRY; MATHEMATICAL MODELS; MODELS; MULTIPHASE FLOW; NUMERICAL METHODS; PARAFFINS; PROCESS ENGINEERING; PROGRAM PROCESSORS;

COMPUTER SIMULATION;

EID: 80051667072     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2011.05.029     Document Type: Article

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