Atmospheric-pressure argon plasma etching of spin-coated 3,4-polyethylenedioxythiophene:polystyrenesulfonic acid (PEDOT:PSS) films for cupper phtalocyanine (CuPc)/C60 heterojunction thin-film solar cells

Thin Solid Films

Volumn 519, Issue 20, 2011, Pages 6834-6839

  Ino, Tomohisa ^a   Hayashi, Tatsuya ^a   Ueno, Keiji ^a   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

CuPc C60; Organic thin film solar cells; PEDOT:PSS; Plasma etching; Real time ellipsometric study

Indexed keywords

ARGON PLASMA ETCHING; CUPC/C60; DEPTH PROFILE; ETCHING CONDITION; HOLE TRANSPORT LAYERS; MOLAR CONCENTRATION RATIO; ORGANIC THIN-FILM SOLAR CELLS; PEDOT:PSS; PHTALOCYANINE; REAL TIME; THIN-FILM SOLAR CELLS; TOP SURFACE;

ATMOSPHERIC PRESSURE; CARRIER MOBILITY; HETEROJUNCTIONS; OPTICAL CONSTANTS; PLASMA ETCHING; PLASMAS; POLYSTYRENES; SPECTROSCOPIC ELLIPSOMETRY; SPECTRUM ANALYSIS;

CONDUCTING POLYMERS;

EID: 80051547199     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.042     Document Type: Conference Paper

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