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Volumn 85, Issue 3, 2011, Pages 1253-1259
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Fast heating induced impulse halogenation of refractory sample components in electrothermal atomic absorption spectrometry by direct injection of a liquid halogenating agent
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Author keywords
Electrothermal vaporization and atomization; GFAAS; Graphite furnace atomic absorption spectrometry; Halocarbon assisted clean out; Halogenating precursor; Memory effect
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Indexed keywords
ABSORPTION SPECTROSCOPY;
ATOMS;
BISMUTH COMPOUNDS;
CALIBRATION;
CHLORINE COMPOUNDS;
DIRECT INJECTION;
ELECTRIC HEATING;
ERBIUM;
ERBIUM COMPOUNDS;
FLUORESCENCE SPECTROSCOPY;
FURNACES;
GRAPHITE;
HALOGENATION;
LITHIUM COMPOUNDS;
NEODYMIUM COMPOUNDS;
NIOBIUM COMPOUNDS;
REFRACTORY MATERIALS;
SINGLE CRYSTALS;
TELLURIUM COMPOUNDS;
CLEAN-OUT;
ELECTROTHERMAL VAPORIZATION;
GFAAS;
GRAPHITE FURNACE ATOMIC ABSORPTION SPECTROMETRY;
HALOGENATING PRECURSOR;
MEMORY EFFECTS;
ATOMIC ABSORPTION SPECTROMETRY;
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EID: 79961127917
PISSN: 00399140
EISSN: None
Source Type: Journal
DOI: 10.1016/j.talanta.2011.05.028 Document Type: Article |
Times cited : (5)
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References (34)
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