Soft-lithography fabrication of microfluidic features using thiol-ene formulations

Lab on a Chip

Volumn 11, Issue 16, 2011, Pages 2772-2778

  Ashley, John F ^a,b   Cramer, Neil B ^a   Davis, Robert H ^a   Bowman, Christopher N ^a,c  

^a UCB 450   (United States)

^b Ashley/McCormick Research Institute   (United States)

^c UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC ACID; OXYGEN; RESIN; THIOL DERIVATIVE; THIOL ENE; UNCLASSIFIED DRUG;

ARTICLE; BINDING AFFINITY; CHEMICAL STRUCTURE; CONFOCAL MICROSCOPY; DEVICE; EQUIPMENT DESIGN; GEOMETRY; LITHOTRIPSY; MICROFLUIDICS; MICROTECHNOLOGY; PRIORITY JOURNAL; QUALITY CONTROL; REDUCTION;

EID: 79960934978     PISSN: 14730197     EISSN: 14730189     Source Type: Journal    
DOI: 10.1039/c1lc20189a     Document Type: Article

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