Characterization and photocatalytic activity of Fe- and N-co-deposited TiO2 and first-principles study for electronic structure

Journal of Solid State Chemistry

Volumn 184, Issue 8, 2011, Pages 2053-2060

  Yen, Chung Chih ^a   Wang, Da Yung ^b   Chang, Li Shin ^a   Shih, Han C ^a,c  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b MINGDAO UNIVERSITY   (Taiwan)

^c CHINESE CULTURE UNIVERSITY   (Taiwan)

Author keywords

(Fe,N) co deposition TiO2; Band gap energy; First principle calculation; Photo catalysis; Titanium dioxide

Indexed keywords

(FE,N) CO-DEPOSITION TIO2; BAND GAP ENERGY; ELECTRON-HOLE RECOMBINATION; FIRST PRINCIPLE CALCULATIONS; FIRST-PRINCIPLE CALCULATION; FIRST-PRINCIPLES STUDY; IMPURITY LEVEL; METAL PLASMA ION IMPLANTATION; N-DOPED TIO; PHOTOCATALYTIC ACTIVITIES; REMOVAL RATE; TEMPERATURE REGIMES; TIO; VISIBLE-LIGHT IRRADIATION;

CALCULATIONS; ELECTRON MOBILITY; ELECTRONIC STRUCTURE; ENERGY GAP; ION IMPLANTATION; OXIDES; PHOTOCATALYSIS; PLASMA DEPOSITION; TITANIUM;

TITANIUM DIOXIDE;

EID: 79960697778     PISSN: 00224596     EISSN: 1095726X     Source Type: Journal    
DOI: 10.1016/j.jssc.2011.05.036     Document Type: Article

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