Sulfur-doping of rutile-titanium dioxide by ion implantation: Photocurrent spectroscopy and first-principles band calculation studies

Journal of Applied Physics

Volumn 93, Issue 9, 2003, Pages 5156-5160

  Umebayashi, T ^a   Yamaki, T ^b   Yamamoto, S ^b   Miyashita, A ^b   Tanaka, S ^b   Sumita, T ^c   Asai, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TAKASAKI ADVANCED RADIATION RESEARCH INSTITUTE   (Japan)

^c JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); IRRADIATION; PHOTOCURRENTS; RADIATION DAMAGE; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SULFUR; SYNTHESIS (CHEMICAL); TITANIUM DIOXIDE;

ION CHANNELING ANALYSIS;

ION IMPLANTATION;

EID: 0037648907     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1565693     Document Type: Article

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