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Volumn 88, Issue 8, 2011, Pages 2126-2128
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Fabrication and characterization of e-beam photoresist array for biomimetic self-cleaning dry adhesives
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Author keywords
Biomimetic; Contact angle; Dry adhesive; E beam resist; Self cleaning
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Indexed keywords
ADHESION FORCES;
ADHESION STRENGTHS;
AFM;
CONTACT AREA RATIO;
DRY ADHESIVE;
E-BEAM LITHOGRAPHY;
E-BEAM RESIST;
NANO-GAP;
NANO-METER SCALE;
NANO-PILLAR ARRAYS;
PILLAR ARRAYS;
SELF-CLEANING;
SELF-CLEANING EFFECTS;
SURFACE APPROACH;
ADHESION;
ADHESIVES;
ANGLE MEASUREMENT;
BIOMIMETICS;
BOND STRENGTH (MATERIALS);
CONTACT ANGLE;
FABRICATION;
PHOTORESISTS;
SURFACE CHEMISTRY;
CLEANING;
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EID: 79960051888
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2011.01.049 Document Type: Conference Paper |
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Times cited : (2)
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References (14)
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