SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2725-2728

Visible microlaser two-photon polymerization in a microfludic cell: A resist study

(4) Honegger, T a Elmberg, T a Berton, K a Peyrade, D a

a CEA LETI (France)

Author keywords

2 Photon polymerization; Actuation; Arm; Colloid; Microfluidics; Resist

Indexed keywords

2-PHOTON POLYMERIZATION; 3D STRUCTURE; ACTUATION; ARM; ELECTRICAL FIELD; MICROFABRICATION PROCESS; MICROFLUIDIC CHANNEL; MICROLASER; PHOTOSENSITIVE POLYMERS; RESIST; RESIST FLOW; SCAN METHODS; TWO PHOTON POLYMERIZATION;

FLUIDIC DEVICES; LIGHT SENSITIVE MATERIALS; MICROELECTRONICS; MICROFLUIDICS; MULTIPHOTON PROCESSES; PHOTONS; POLYMERIZATION; STRUCTURES (BUILT OBJECTS);

POLYMERS;

EID: 79960045423 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2010.12.094 Document Type: Conference Paper

Times cited : (10)

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