Effect of chain length of self-assembled monolayers in dip-pen nanolithography using molecular dynamics simulations

Journal of Colloid and Interface Science

Volumn 361, Issue 1, 2011, Pages 316-320

  Wu, Cheng Da ^a   Fang, Te Hua ^a   Lin, Jen Fin ^b  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Chain length; Dip pen nanolithography; Meniscus; Molecular dynamics; SAM

Indexed keywords

ALKANETHIOLS; DIP-PEN NANOLITHOGRAPHY; ENERGY INCREASE; MENISCUS; MOLECULAR DYNAMICS SIMULATIONS; MOLECULAR TRANSFER; PATTERN FORMATION; PATTERN HEIGHTS; PATTERN TRANSFERS; ROOM TEMPERATURE; SAM; SIMULATION RESULT; SUBSTRATE SURFACE;

CHAIN LENGTH; DYNAMICS; MOLECULES; NANOLITHOGRAPHY; ORGANIC POLYMERS; SELF ASSEMBLED MONOLAYERS;

MOLECULAR DYNAMICS;

ALKANE DERIVATIVE;

ADSORPTION; ARTICLE; DIFFUSION; DIP PEN NANOLITHOGRAPHY; ENERGY; MOLECULAR DYNAMICS; MOLECULE; NANOTECHNOLOGY; PRIORITY JOURNAL; ROOM TEMPERATURE; SIMULATION;

EID: 79959805338     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.05.040     Document Type: Article

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