Formation of platinum nanoflowers on 3-aminopropyltriethoxysilane monolayer: Growth mechanism and electrocatalysis

Applied Catalysis A: General

Volumn 401, Issue 1-2, 2011, Pages 226-232

  Li, Yongxin ^a   Xian, Hongying ^a   Zhou, Yuan ^a  

^a ANHUI NORMAL UNIVERSITY   (China)

Author keywords

Electrocatalysis; Electrodeposition; Methanol; Oxygen; Pt nanoflower

Indexed keywords

3-AMINOPROPYLTRIETHOXYSILANE; ELECTROCATALYTIC; ELECTROCATALYTIC ACTIVITY; ELECTROCHEMICAL METHODS; GROWTH MECHANISMS; MODIFIED ELECTRODES; OXIDATION OF METHANOL; PT NANOPARTICLES; REDUCTION OF OXYGEN; XRD;

CATALYSIS; CATALYST ACTIVITY; ELECTROCATALYSIS; ELECTROCHEMISTRY; ELECTRODES; METHANOL; MONOLAYERS; OXYGEN; PLATINUM; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; X RAY POWDER DIFFRACTION;

NANOFLOWERS;

EID: 79959753066     PISSN: 0926860X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcata.2011.05.027     Document Type: Article

References (55)

1. M.A. El-Sayed Acc. Chem. Res. 34 2001 257 264
2. W. Ahmed, E.S. Kooij, A. van Silfhout, and B. Poelsema Nano Lett. 9 2009 3786 3794
3. L.B. Hu, H.S. Kim, J.Y. Lee, P. Peumans, and Y. Cui ACS Nano 4 2010 2955 2963
4. X.Y. Zhang, D. Li, L. Bourgeois, H.T. Wang, and P.A. Webley ChemPhysChem 10 2009 436 441
5. Y.M. Zhai, J.F. Zhai, and S.J. Dong Chem. Commun. 46 2010 1500 1502
6. J. Zhang, J. Du, B. Han, Z. Liu, T. Jiang, and Z. Zhang Angew. Chem. Int. Ed. 45 2006 1116 1119
7. Y. Sun, and Y. Xia Science 298 2002 2176 2179
8. X. Sun, S. Dong, and E. Wang Angew. Chem. Int. Ed. 43 2004 6360 6363
9. H. Ye, and R.M. Crooks J. Am. Chem. Soc. 127 2005 4930 4934
10. A.P. O'Mullane, S.E. Dale, J.V. Macpherson, and P.R. Unwin Chem. Commun. 2004 1606 1607
11. N. Tian, Z.Y. Zhou, S.G. Sun, Y. Ding, and Z.L. Wang Science 316 2007 732 735
12. X. Teng, X. Liang, S. Maksimuk, and H. Yang Small 2 2006 249 253
13. T.S. Ahmadi, Z.L. Wang, T.C. Green, A. Henglein, and M.A. El-Sayed Science 272 1996 1924 1926
14. T. Kijima, T. Yoshimura, M. Uota, T. Ikeda, D. Fujikawa, S. Mouri, and S. Uoyama Angew. Chem. Int. Ed. 43 2004 228 232
15. H.P. Liang, H.M. Zhang, J.S. Hu, Y.G. Guo, L.J. Wan, and C.L. Bai Angew. Chem. Int. Ed. 43 2004 1540 1543
16. H.J. Shin, R. Ryoo, Z. Liu, and O. Terasaki J. Am. Chem. Soc. 123 2001 1246 1247
17. B. Lim, M. Jiang, P.H.C. Camargo, E.C. Cho, J. Tao, X. Lu, Y. Zhu, and Y. Xia Science 324 2009 1302 1305
18. B. Lim, J. Wang, P.H.C. Camargo, C.M. Cobley, M.J. Kim, and Y. Xia Angew. Chem. Int. Ed. 48 2009 6304 6308
19. Z. Peng, and H. Yang J. Am. Chem. Soc. 131 2009 7542 7543
20. C. Wang, H. Daimon, Y. Lee, J. Kim, and S. Sun J. Am. Chem. Soc. 129 2007 6974 6975
21. C. Wang, H. Daimon, T. Onodera, T. Koda, and S. Sun Angew. Chem. Int. Ed. 47 2008 3588 3591
22. L. Qian, and X. Yang J. Phys. Chem. B 110 2006 16672 16678
23. F. Ye, J. Li, T. Wang, Y. Liu, H. Wei, J. Li, and X. Wang J. Phys. Chem. C 112 2008 12894 12898
24. F. Shang, J.D. Glennon, and J.H.T. Luong J. Phys. Chem. C 112 2008 20258 20263
25. I. Gonzalez-Gonzalez, E.R. Fachini, M.A. Scibioh, D.A. Tryk, M. Tague, H.D. Abruna, and C.R. Cabrera Langmuir 25 2009 10329 10336
26. F. Xiao, F. Zhao, Y. Zhang, G. Guo, and B. Zeng J. Phys. Chem. C 113 2009 849 855
27. D. Du, and K. Uosaki J. Phys. Chem. B 110 2006 17570 17577
28. P. Wang, F. Li, X. Huang, Y. Li, and L. Wang Electrochem. Commun. 10 2008 195 199
29. P. Wang, Y. Li, X. Huang, and L. Wang Talanta 73 2007 431 437
30. P. Wang, Z. Ma, Z. Dai, Y. Li, and X. Zou Biosens. Bioelectron. 24 2009 3242 3247
31. H. Angerstein-Kozlowska, B.E. Conway, and W.B.A. Sharp J. Eelctroanal. Chem. 43 1973 9 36
32. Y. Li, J.T. Cox, and B. Zhang J. Am. Chem. Soc. 132 2010 3047 3054
33. J.R. Lenhard, and R.W. Murray J. Eelctroanal. Chem. 78 1977 195 201
34. R.W. Murray Acc. Chem. Res. 13 1980 135 141
35. C.H. Chen, J.E. Hutchison, T.A. Postlethwaite, J.N. Richardson, and R.W. Murray Langmuir 10 1994 3332 3337
36. A. Simon, T. Cohen-Bouhacina, M.C. Porte, J.P. Aime, and C. Baquey J. Colloid Interface Sci. 251 2002 278 283
37. E. Sherdian, J. Hjelm, and R.J. Forster J. Eelctroanal. Chem. 608 2007 1
38. V.G. Praig, G. Piret, M. Manesse, X. Castel, R. Boukherroub, and S. Szunerits Electrochim. Acta 53 2008 7838 7844
39. D.W.M. Arrigan Analyst 129 2004 1157 1165
40. Y. Li, D. Bergman, and B. Zhang Anal. Chem. 81 2009 5496 5502
41. Y. Shao, M.V. Mirkin, G. Fish, S. Kokotov, D. Palanker, and A. Lewis Anal. Chem. 69 1997 1627 1634
42. S. Guo, L. Wang, and E. Wang Chem. Commun. 2007 3163 3165
43. L. Wang, S. Guo, J. Zhai, X. Hu, and S. Dong Electrochim. Acta 53 2008 2776 2781
44. L. Li, and G. Shi J. Phys. Chem. B 109 2005 23787 23793
45. V. Chechik, and R.M. Crooks Langmuir 15 1999 6364 6369
46. Y. Li, Y. Chen, L. Wang, and Y. Fang Electrochim. Acta 56 2011 1076 1081
47. G.S. Attard, P.N. Bartlett, N.R.B. Coleman, J.M. Elliott, J.R. Owen, and J.H. Wang Science 278 1997 838 840
48. S. Zhang, Y. Shao, G. Yin, and Y. Lin Angew. Chem. Int. Ed. 49 2010 2211 2214
49. Z. Wen, Q. Wang, and J. Li Adv. Funct. Mater. 18 2008 959 964
50. S. Trasatti, and O.A. Petrii Pure Appl. Chem. 63 1991 711 734
51. B.K. Jena, and C.R. Raj J. Phys. Chem. C 112 2008 3496 3502
52. Z. Liu, X.Y. Ling, X. Su, and J.Y. Lee J. Phys. Chem. B 108 2004 8234 8240
53. Y. Lin, X. Cui, C. Yen, and C.M. Wai J. Phys. Chem. B 109 2005 14410 14415
54. X. Teng, X. Liang, S. Maksimuk, and H. Yang Adv. Mater. 17 2005 2237 2241
55. S. Ghosh, and C.R. Raj J. Phys. Chem. C 114 2010 10843 10849