Study of macroporous silicon electrochemical etching in 3D structured N type silicon substrates

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 6, 2011, Pages 1787-1791

  Kouassi, Sebastien ^a   Gautier, Gael ^a   Desplobain, Sebastien ^a   Ventura, Laurent ^a  

^a UNIVERSITÉ DE TOURS   (France)

Author keywords

3D surface; Gas diffusion layer; Macroporous silicon; TMAH

Indexed keywords

3D STRUCTURE; 3D SURFACE; ACTIVE SURFACES; ALKALINE ETCHING; DEEP REACTIVE ION ETCHING; DOPING LAYERS; GAS DIFFUSION LAYER; GAS DIFFUSION LAYERS; GEOMETRICAL PARAMETERS; IMPROVE-A; MACROPOROUS SILICON; MANUFACTURING PROCESS; MICROFUEL CELL; N TYPE SILICON; RIGHT-HAND SIDES; SILICON ETCHING; SURFACE ENHANCEMENT; SURFACE RATIO; TMAH;

ANISOTROPIC ETCHING; DIFFUSION IN GASES; ELECTROCHEMICAL ETCHING; FUEL CELLS; MEMS; REACTIVE ION ETCHING; SUBSTRATES; THREE DIMENSIONAL;

POROUS SILICON;

EID: 79959641697     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000039     Document Type: Article

References (6)

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