Laser deposition of large-area thin films

Quantum Electronics

Volumn 41, Issue 3, 2011, Pages 253-256

  Kuzanyan, A S ^a   Petrosyan, V A ^a   Pilosyan, S Kh ^b   Nesterov, V M ^b  

^a INSTITUTE FOR PHYSICAL RESEARCH   (Armenia)

^b LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

Author keywords

Large area films; Pulsed laser deposition; Uniform thickness

Indexed keywords

AVERAGE VALUES; DEPOSITION CHAMBERS; DISTINCTIVE FEATURES; LARGE-AREA FILMS; LASER DEPOSITIONS; MODERN TECHNOLOGIES; OPTICAL INDUSTRIES; ROTATING SUBSTRATES; SILICON SUBSTRATES; UNIFORM THICKNESS;

ELECTRONICS INDUSTRY; PULSED LASER DEPOSITION; PULSED LASERS; ROTATION; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

DEPOSITION;

EID: 79959568241     PISSN: 10637818     EISSN: None     Source Type: Journal    
DOI: 10.1070/QE2011v041n03ABEH014417     Document Type: Article

References (11)

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