Effect of a boron underlayer on the ordering and orientation of sputtered fept film

Chinese Physics Letters

Volumn 28, Issue 6, 2011, Pages

  Li, Yong Le ^a   Huang, An Ping ^a   Feng, Tang Fu ^a   Chen, Qiang ^a   Shu, Xiao Lin ^a   Chen, Jun Yang ^b   Chen, Zi Yu ^a  

^a BEIHANG UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; IRON ALLOYS; MULTILAYER FILMS; PLATINUM ALLOYS;

ANNEALING TEMPERATURES; BORON ATOM; FEPT FILMS; L1 0 PHASE; MAGNETRON-SPUTTERING; MICRO-STRUCTURAL; MULTILAYERS FILMS; SI (100) SUBSTRATE; UNDERLAYERS; VACUUM-ANNEALING;

BORON;

EID: 79959440569     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/28/6/067502     Document Type: Article

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