Design and fabrication of highly complex topographic nano-imprint template for dual damascene full 3-D imprinting

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  MacDonald, Susan ^a   Hughes, Greg ^a   Stewart, Michael ^b   Palmieri, Frank ^b   Willson, C Grant ^b  

^a Toppan Photomasks Inc   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

3 D structures; Dual Damascene; Nano imprint; SFIL; Template

Indexed keywords

DAMASCENE; DUAL DAMASCENE; TEMPLATE;

ETCHING; LITHOGRAPHY; MASKS; QUARTZ;

NANOTECHNOLOGY;

EID: 33644597431     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632312     Document Type: Conference Paper

References (5)

1. Stewart, M., Wetzel, J et al, Proc. SPIE-Microlithography 2005. 5751-21
2. Resnick, D., Bailey, T.C. et al, Proc. SPIE-Microlithography 2002 High Resolution Templates for Step and Flash Imprint Lithography
3. Jun-Ho Jeong, Young-suk Sim, et al, Proc. SPIE-Microlithography 2005 5751-24 Step and Repeat UVNanoimprint Lithography Using a Large Area Stamp
4. Bailey, T,C., Johnson,S.C., et al, Proc. Journal of Photopolymer Science and Technology 2002. Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology
5. International Technology Roadmap for Semiconductors. 2003 Edition. http://public.itrs.net/Files/2003ITRS/Home2003.htm