Challenging defect repair techniques for maximizing mask repair yield

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Garetto, Anthony ^a   Oster, Jens ^b   Waiblinger, Markus ^b   Edinger, Klaus ^b  

^a Carl Zeiss Vision Inc USA   (United States)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

AIMS 45 193i; Defect repair; Electron beam repair; Mask repair; MeRiT MG 45; Repair yield

Indexed keywords

CYCLE TIME REDUCTION; DEFECT REPAIR; DEFECT TYPE; ECONOMIC CLIMATES; MASK REPAIR; MASK YIELD; OPAQUE DEFECTS; PRODUCTION LINE; REPAIR TOOLS; SINGLE-MASK;

CRANKSHAFTS; DEFECTS; ELECTRON BEAMS; PHOTOMASKS;

REPAIR;

EID: 79959334957     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.833404     Document Type: Conference Paper

References (3)

1. A. Garetto, C. Baur, J. Oster, M. Waiblinger, and K. Edinger, "Advanced process capabilities for electron beam based photomask repair in a production environment", Proc. SPIE Vol. 7122, (2008).
2. T. Liang, A. Stivers, M. Penn, D. Bald, and C. Sethi, "Demonstration of Damage-Free Mask Repair Using Electron Beam-induced Processes", Proc. SPIE Vol. 5446, 291 (2004).
3. C. Ehrlich, K. Edinger, V. Boegli, and P. Kuschnerus, "Application data of the electron beam based photomask repair tool Merit MG", Proc. SPIE Vol. 5835, 145 (2005).