Application data of the electron beam based photomask repair tool MeRiT MG

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5835, Issue , 2005, Pages 145-154

  Ehrlich, Christian ^a   Edinger, Klaus ^b   Boegli, Volker ^b   Kuschnerus, Peter ^a  

^a CARL ZEISS SMT AG   (Germany)

^b NaWoTec GmbH   (Germany)

Author keywords

Binary mask; Electron beam; Mask repair; MeRIT; Phase shift; Photomask; PSM; Reticle

Indexed keywords

COST EFFECTIVENESS; DATA ACQUISITION; NANOSTRUCTURED MATERIALS; PHASE SHIFT; PHOTOLITHOGRAPHY;

BINARY MASK; MASK REPAIR; MERIT; PHOTOMASK; PSM; RETICLE;

ELECTRON BEAMS;

EID: 27744460377     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637273     Document Type: Conference Paper

References (3)

1. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, paper 5567-165,2004.
2. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, paper 5567-03,2004
3. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, paper 5567-49,2004